面向亚5nm图案化含硅嵌段共聚物的合成与自组装  

Synthesis and Self-assembly of Silicon-containing Block Copolymers for Sub 5nm Nanolithography

作　　者：陶永鑫 陈蕾蕾 刘一寰 胡欣 朱宁 郭凯 Yong-xin Tao;Lei-lei Chen;Yi-huan Liu;Xin Hu;Ning Zhu;Kai Guo(College of Biotechnology and Pharmaceutical Engineering,State Key Laboratory of Materials-Oriented Chemical Engineering,Nanjing Tech University,Nanjing 211800;College of Materials Science and Engineering,Nanjing Tech University,Nanjing 211800)

机构地区：[1]南京工业大学生物与制药工程学院材料化学工程国家重点实验室,南京211800 [2]南京工业大学材料科学与工程学院,南京211800

出　　处：《高分子学报》2022年第12期1445-1458,共14页Acta Polymerica Sinica

摘　　要：嵌段共聚物的合成及其应用是高分子科学领域的研究热点.近年来,国内外学者设计了一系列新型含硅嵌段共聚物,具有较高的Flory-Huggins相互作用参数,在自组装制备亚5 nm特征图案方面取得了重大突破,有望应用于下一代半导体制造.本文总结了聚二甲基硅氧烷基、聚含硅苯乙烯基和聚倍半硅氧烷基3种类型含硅嵌段共聚物的合成,讨论了在本体和薄膜自组装纳米图案化方面的研究进展,对相关领域存在的挑战与机遇进行了展望.Ever-shrinking pattern features present challenges for the semiconductor industry.Directed self-assembly(DSA)of block copolymers(BCP)has been demonstrated as one high throughput and low cost manufacturing candidate for the next-generation of nanolithography.The thermodynamically immiscible polymer blocks self assemble into the ordered nanostructures with varied morphologies,and the feature size is dependent on the Flory Huggins interaction parameter(χ)and the molecular weight(N)of BCP according to the self-consistent mean field theory.Design,synthesis,and self-assembly of novel highχlow N BCP is the long-term target for the community of polymer chemistry and materials science with the aim to achieve small size microphase separation domains.This review focuses on self-assembly of silicon-containing block copolymers for sub 5 nm nanolithography.Silicon containing block copolymers not only exhibit highχbut also improve etch contrast property,which are considered as the promising materials for nanolithography.After a brief introduction of DSA,the main body is divided into three sections according to the chemical structures,including poly(dimethylsioxane)-based BCP,poly(silicon containing styrene)-based BCP,and poly(hedraloligomeric silsesquioxane)-based BCP.Each section covers self-assembly of bulk polymer and/or thin film,from historic initial study(>5 nm)to the recent progress(<5 nm).Synthesis,characterizations,χ,assembly conditions,feature sizes are discussed in detail.Finally,the challenges and opportunities are proposed.We hope this review would provide insights into polymer science and nanolithography technology.

关 键 词：含硅嵌段共聚物 自组装 纳米光刻 亚5nm FLORY-HUGGINS 相互作用参数 

分 类 号：O631.5[理学—高分子化学]