锡掺杂对氧化镍薄膜电致变色性能的影响  

Effect of Tin Doping on Electrochromic Performance of Nickel Oxide Film

作　　者：吴欢 WU Huan(Guangdong University of Technology,Guangzhou Guangdong 510006,China)

机构地区：[1]广东工业大学材料与能源学院,广东广州510006

出　　处：《辽宁化工》2022年第11期1520-1522,共3页Liaoning Chemical Industry

摘　　要：采用溶胶法和旋涂技术制备了NiO薄膜和一系列锡掺杂的NiO薄膜,对其进行了形貌、成分表征和电致变色性能测试。结果表明:锡镍摩尔比为1/10的1Sn-NiO薄膜光调制79.1%,比NiO薄膜的光调制增大31.3%。适量的锡掺杂能有效提高NiO薄膜的变色性能。NiO film and a series of tin doped NiO films were prepared using sol method and spin coating techniques,and the morphology,component characterization and electrochromic performance test were performed.The results showed that the optical modulation of Sn-NiO of molar ratio of 1/10 was 79.1%,which was 31.3%higher than the NiO film.The appropriate amount of tin doping could effectively improve the color change properties of the NiO film.

关 键 词：氧化镍 电致变色 掺杂改性 光调制 

分 类 号：O484.4[理学—固体物理]