高能电子束电磁透镜的研究进展  

Research Progress of Electron Beam Focusing and Deflection Techniques

作　　者：唐腾飞 刘海浪[1] 岳高 唐杰 宁蔚 刘坤明 骆玉城 TANG Tengfei;LIU Hailang;YUE Gao;TANG Jie;NING Wei;LIU Kunming;LUO Yucheng(School of Mechanical and Electrical Engineering,Guilin University of Electronic Technology,Guilin 541004,China;Guilin Fuda Co.,Ltd.,Guilin 541199,China)

机构地区：[1]桂林电子科技大学机电工程学院,桂林541004 [2]桂林福达股份有限公司,桂林541199

出　　处：《真空科学与技术学报》2022年第10期719-725,共7页Chinese Journal of Vacuum Science and Technology

基　　金：桂林电子科技大学博士基金项目(UF21003Y);广西自然科学基金(2021GXNSFBA196038);广西科技计划项目(桂科AD22035116);中国博士后科学基金项目(2022M710920)。

摘　　要：在电子束加工设备中,聚焦系统和偏转系统是决定电子枪性能的关键因素。介绍了电子束聚焦、偏转技术的原理和特点,归纳整理了电磁透镜结构的优化结果、电子束聚焦规律以及减小束斑像差控制等方面所取得的研究进展。分析了目前电磁透镜控制电子束加工中存在的不足,并对未来电子枪发展趋势做出了展望。In electron beam processing equipment,the focusing system and deflection system are the key factors in determining the excellent performance of the electron gun. This paper introduces the principle and characteristics of electron beam focusing and deflection technology and summarizes the research progress made in the optimization results of electromagnetic lens structure,electron beam focusing law,and controlling the reduction of beam spot aberration. The shortcomings of the current electromagnetic lens-controlled electron beam processing are analyzed,and the future development trend of electron guns is prospected.

关 键 词：电子束 聚焦系统 偏转系统 电磁透镜 束斑像差 

分 类 号：TN03[电子电信—物理电子学]