硫化物光催化剂光腐蚀的研究进展  

Research Progress on Photocorrosion of Sulfide Photocatalyst

作　　者：张崇文 陈巧玲 王思琪 郑毅[1] ZHANG Chongwen;CHEN Qiaoling;WANG Siqi;ZHENG Yi(School of Petrochemical Engineering,Lanzhou University of Technology,Lanzhou 730050,China)

机构地区：[1]兰州理工大学石油化工学院,甘肃兰州730050

出　　处：《化工技术与开发》2022年第12期35-40,共6页Technology & Development of Chemical Industry

基　　金：国家自然科学基金项目(21802060);2017年博士科研启动费(061701)。

摘　　要：光催化分解水制氢是解决全球环境污染和能源短缺问题的一种很有前景的策略。然而,硫化物光催化剂在光照下会发生严重的光腐蚀,极大影响了光催化技术的实际应用。针对这一问题,本文论述了硫化物半导体的光腐蚀机理,总结了提高硫化物光催化剂的抗光腐蚀性能的各种策略,包括改变半导体的结晶度或形态、掺杂杂原子、与各种助催化剂杂化等。最后,对抗光腐蚀的硫化物光催化剂的研究方向与未来前景进行了展望。Photocatalytic water splitting for hydrogen production was a promising strategy to solve the problems of global environmental pollution and energy shortage.However,sulfide photocatalysts suffered from severe photocorrosion under illumination,which greatly affected the practical application of photocatalytic technology.In response to this problem,this review dicussed the photocorrosion mechanism of sulfide semiconductors,summarized various strategies to improve the photocorrosion resistance of sulfide photocatalysts,included changing the crystallinity or morphology of semiconductors,doping heteroatoms,and various cocatalyst hybridization,etc.Finally,the research direction and future prospects of photocorrosion-resistant sulfide photocatalysts were prospected.

关 键 词：硫化物 光催化剂 光腐蚀 助催化剂 掺杂 

分 类 号：O643.36[理学—物理化学]