改进灰狼算法提高数字光刻图像质量的研究  

Improved Image Quality of Digital Lithography Using Modified Gray Wolf Optimization Algorithm

作　　者：杨成 刘红[1] 王英志[2] 胡俊[2] YANG Cheng;LIU Hong;WANG Yingzhi;HU Jun(School of Opto-Electronic Engineering,Changchun University of Technology,Changchun 130022;School of Electronic and Information Engineering,Changchun University of Technology,Changchun 130022)

机构地区：[1]长春理工大学光电工程学院,长春130022 [2]长春理工大学电子信息工程学院,长春130022

出　　处：《长春理工大学学报（自然科学版）》2022年第6期59-66,共8页Journal of Changchun University of Science and Technology(Natural Science Edition)

基　　金：吉林省科技发展计划项目(20200401116GX,20200602005ZP);吉林省教育厅“十三五”科学技术研究项目(JJKH20200774KJ)。

摘　　要：图像失真问题是数字光刻系统中很重要的问题,为了优化数字光刻图形质量提出了一种改进的灰狼优化算法(FGWO)。采用图形保真度作为适应度函数,掩模图案中的像素被用作灰狼个体,然后以狼群团体合作狩猎机制使掩模图形得到优化。对两种不同复杂度的数字掩模图形的仿真验证表明FGWO算法相比SFL-GWO算法和LGWO算法,图像误差分别降低了82.46%、76.74%和81.46%、75.03%。通过实验结果可以看出,同一实验环境下,FGWO算法优化后掩模光刻图形质量较之SFL-GWO算法和LGWO算法得到了很大的改善。Image distortion is a key problem in DMD digital lithography system.A digital lithography quality optimization algorithm based on improved gray wolf optimization algorithm is proposed in this paper.the graph fidelity is used as the fitness function,the pixels in the mask pattern are used as gray wolf individuals,and then the mask is optimized based on the mechanism of wolf group cooperation.The simulation results of periodic contact hole array and complex mask pattern with Cross Gate show that the image error of this algorithm is reduced by 82.46%,76.74%and 81.46%,75.03%respectively compared with SFL-GWO and LGWO.At the same time,the experimental results show that under the same experimental environment,the pattern quality of mask lithography optimized by this algorithm has been greatly improved compared with SFL-GWO and LGWO,which further verifies the effectiveness of this algorithm.

关 键 词：图像失真问题 掩模优化 改进灰狼优化算法 

分 类 号：O482.31[理学—固体物理]