表面微观结构对钛基电极锡锑氧化物层泥裂的影响  

Effect of Surface Microstructure on Mud Crack in Antimony-Doped Tin Oxide Layer of Ti Electrode

在线阅读下载全文

作  者:朵亚琳 王岚[1] 张烨[1] 王龙耀[1] DUO Yalin;WANG Lan;ZHANG Ye;WANG Longyao(School of Petroleum and Chemical Engineering,Changzhou University,Changzhou 213164,China)

机构地区:[1]常州大学石油化工学院,江苏常州213164

出  处:《化学反应工程与工艺》2022年第6期560-565,共6页Chemical Reaction Engineering and Technology

摘  要:在钛基金属氧化物电极制备过程中,锡锑氧化物(ATO)层泥裂是影响电极性能的一个关键难题。分别以致密钛板、钛金属粉末和多孔钛板为基体,研究钛基材料表面微观结构对ATO层泥裂现象的影响,并对电极的表面形貌、阻抗和抗氧化性能进行表征和分析。研究结果表明:基体材料微米级薄壁弯曲结构对ATO层的应力具有明显的缓解效果,刻蚀产生的坑道壁对ATO层具有分隔锚定作用,二者结合能够有效消除钛基ATO层的泥裂现象,电极性能得到大幅提升。以多孔钛板为基体制备得到的ATO电极的电荷转移电阻(R_(ct))约为0.5Ω,仅为致密钛板基体的1/20。电流-时间曲线(扫描电位为2.0 V,电解质为0.5 mol/L的H_(2)SO_(4))表明,多孔钛板基ATO电极的稳定电流密度为40 mA/cm^(2),致密钛板基ATO电极的则仅为0.2 mA/cm^(2)。In the preparation process of titanium-based metal oxide electrodes,the mud cracking of the antimony-doped tin oxide(ATO)layer is a key problem that affects the performance of the electrode.Using dense titanium plate,titanium metal powder and porous titanium plate as the matrix,the effect of the surface microstructure of the titanium-based material on the mud cracking phenomenon of the ATO layer was experimentally studied,and the surface morphology,impedance and oxidation resistance of the electrode were characterized and analyzed.The results showed that the micron-level thin-walled bending structure of the matrix material had a significant relief effect on the stress of the ATO layer,and the tunnel wall produced by etching had a separation and anchoring effect on the ATO layer.Based on the above two reasons,the mud crack of the Ti-based ATO layer was effectively eliminated and the performance of the electrode was greatly improved.The charge transfer resistance(R_(ct))of the ATO electrode prepared with the porous titanium plate as the matrix was about 0.5Ω,which was only 1/20 of the dense titanium plate matrix.The current-time curve(scanning potential:2.0 V,electrolyte:0.5 mol/L H_(2)SO_(4))showed that the stable current density of the porous titanium plate-based ATO electrode was 40 mA/cm^(2),while the dense titanium plate-based ATO electrode was only 0.2 mA/cm^(2).

关 键 词:钛阳极 锡锑氧化物层 电极 泥裂 

分 类 号:TQ050.4[化学工程]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象