日用化妆品用新型表面活性剂复配性能研究  被引量:7

Study on the mixing properties of a new surfactant for daily cosmetics

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作  者:郑丽艳[1] 范智军 Liyan Zheng;Zhijun Fan(Light Chemical Technology School,Guangdong Industry Polytechnic,Guangzhou,Guangdong 510300,China;Geographical Sciences School,South China Normal University,Guangzhou,Guangdong 510631,China)

机构地区:[1]广东轻工职业技术学院轻化工技术学院,广东广州510300 [2]华南师范大学地理科学学院,广东广州510631

出  处:《日用化学工业(中英文)》2022年第12期1300-1306,共7页China Surfactant Detergent & Cosmetics

基  金:2018年广东省高等职业教育教学改革研究与实践项目(GDJG2019172);2019年广东轻工职业技术学院创新创业导师工作室项目(201907);广东轻工职业技术学院人才类项目(KYRC2020-015)。

摘  要:为了探究日用化妆品用新型表面活性剂复配性能。合成了乙二醇双琥珀酸一氯羟丙基季铵双酯磺酸钠产物(HDBC),并与十二烷基硫酸钠(SDS)混合制备新型表面活性剂(NPG)作为复配性能研究样品。对其进行了表面张力、润湿性能、亲水亲油平衡值、乳化性能和泡沫性能的测试。结果显示,当表面活性剂质量浓度达到10 g/L时,最低表面张力为31.5 mN/m,新型表面活性剂的表面张力随质量浓度增加呈现下降趋势,表现出良好的表面活性。表面活性剂溶液接触角数值不断降低,显示了良好的润湿性能。新型表面活性剂的HLB值在10~18范围内,展示了良好的亲水性。此外,当HDBC和SDS摩尔比为5∶5时,制备的NPG质量分数为80%时,泡沫性能和乳化性能较优。The mixing properties of a new surfactant for daily cosmetics were studied.Surfactant mixtures(NPG)were prepared by mixing sodium dodecyl sulfate(SDS)with the new surfactant(HDBC)which was a derivative of ethylene glycol bissuccinate containing monochlorohydroxypropyl,quaternary ammonium and sulfonate groups in different mixing ratios.Surface tension,wettability,hydrophilic-lipophilic balance,emulsifying property and foam property were tested.The results showed that when the mass concentration of the mixed surfactants reached 10 g/L,the minimum surface tension reached 31.5 mN/m,indicative of good surface activity.The surface tension of the new surfactant mixtures was decreased with the increase of mass concentration.The contact angle of the mixed surfactant solution was decreased with concentration,showing good wettability.The HLB values of the new surfactant mixtures were in the range of 10-18,showing good hydrophilicity.In addition,when the molar ratio of HDBC to SDS was 5∶5 and the mass fraction of NPG was 80%,the foam performance and emulsification performance were good.

关 键 词:表面活性剂 复配体系 表面张力 湿润性能 接触角 亲水亲油平衡值 

分 类 号:TQ423[化学工程]

 

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