YBa_(2)Cu_(3)O_(7-δ)超导薄膜的氩氧混合离子刻蚀效应研究  

Argon-oxygen mixed ion etching effect of YBa_(2)Cu_(3)O_(7-δ) superconducting films

作　　者：王岩 赵苏串[1] 曾志刚[1] 吴开荣 肖书良 蔡传兵[1] Wang Yan;Zhao Suchuan;Zeng Zhigang;Wu Kairong;Xiao Shuliang;Cai Chuanbing(Shanghai Key Laboratory of High Temperature Superconductors,Shanghai Frontiers Science Center of Quantum and Superconducting Matter States,Department of Physics,Shanghai University,Shanghai 200444,China)

机构地区：[1]上海大学理学院物理系,上海市量子与超导新物态前沿科学基地,上海市高温超导重点实验室,上海200444

出　　处：《低温与超导》2022年第10期1-6,共6页Cryogenics and Superconductivity

基　　金：国家自然科学基金(52172271);中国科学院先导专项(XDB25000000)资助。

摘　　要：采用低能氩氧混合离子刻蚀对YBCO薄膜进行表面优化处理,并研究了刻蚀对超导性能的影响。结果表明,该刻蚀方法可有效去除YBCO薄膜表面的异质相,减小表面粗糙度,且不会破坏薄膜的晶体结构。刻蚀样品的临界电流密度(J_(c))提升了16%以上(77 K,自场)。相比于纯氩离子刻蚀,氩氧混合离子刻蚀可有效缓解样品高场下载流能力的衰减。In this paper, low energy argon-oxygen mixed ion etching was used to optimize the surface of YBCO films, and the effect of etching on superconductivity was studied. The results show that this etching method can effectively remove the heterogeneous phase on the surface of YBCO films and reduce the surface roughness without damaging the crystal structure of the films. The critical current density(J_(c)) of the etched samples is enhanced by more than 16%(77 K, self-field). Compared with pure argon ion etching, argon-oxygen mixed ion etching can effectively reduce the decay of the sample’s current capability at high fields.

关 键 词：YBCO薄膜 表面优化 氩氧混合离子刻蚀 临界电流密度 

分 类 号：TQ174[化学工程—陶瓷工业]