金纳米阵列诱导表面等离子体微刻蚀试验分析  

Experimental Analysis of Surface Plasmon Microetching Induced by Gold Nanoarrays

作　　者：杨嫄 聂溪晗 缪文锋 赵静楠 郭志全[1,2] Yang Yuan;Nie Xihan;Miao Wenfeng;Zhao Jingnan;Guo Zhiquan(Tianjin University of Science and Technology,Facultyof Mechanical Engineering,Tianjin 300222,China;Tianjin Key Laboratory of Integrated Design and On-line Monitoring for Light Industry&Food Machinery and Equipment,Tianjin 300222,China)

机构地区：[1]天津科技大学机械工程学院,天津300222 [2]天津市轻工与食品工程机械装备集成设计与在线监控重点实验室,天津300222

出　　处：《应用激光》2022年第9期74-81,共8页Applied Laser

基　　金：天津市自然科学基金(17JCYBJC42400);天津市教委科研基金(2017KJ020)。

摘　　要：通过麦克斯韦方程组推导了等离子体激发的条件,随后根据表面等离激元在亚波长孔周期阵列中增强光传输的原理制备金属-介质-金属(MIM)型周期性孔阵列薄膜,这种薄膜结构可补充入射光与等离子体基元间的动量失衡,进而在金属表面成功实现表面等离子体的激发。最后利用所制备的MIM型周期性孔阵列结构进行激光微纳加工试验,探索其在激光微纳加工中的作用。选择单晶硅作为激光微纳加工的对象,试验结果表明,这种薄膜结构可通过诱导激发等离子体实现材料的去除,在硅片的表面制备出大范围的微孔结构。Based on the maxwell’s equations, plasma excitation conditions were derived. Metal dielectric metal(MIM) periodic hole array films were prepared based on the principle of surface plasmon enhanced light transmission in subwavelength hole periodic arrays. This film structure can supplement the momentum imbalance between the incident light and plasma elements, and then successfully realize the excitation of surface plasma on the metal surface. Finally, the MIM periodic hole array structure was used to conduct laser micro-nano machining experiments and its role in laser micro-nano machining was explored. Monocrystalline silicon was selected as the object of laser micro-nano processing. The experimental results show that this kind of thin film structure can remove materials by inductively excited plasma, and a wide range of microporous structures can be prepared on the surface of silicon wafers.

关 键 词：金属-介质-金属型结构 等离子体激发 透射增强 周期性孔阵列 多孔阳极氧化铝 激光扫描 

分 类 号：O441[理学—电磁学]