金刚石抛光用镍钨合金镀层的电镀制备工艺  

Electrodeposition process of nickel-tungsten alloy coating for polishing diamond

作　　者：安志博 金洙吉[1] 姜冠楠[1] 王磊 王洪超 An Zhibo;Jin Zhuji;Jiang Guannan;Wang Lei;Wang Hongchao(Key Laboratory of Precision and Non-traditional Machining Technology of Ministry of Education,Dalian University of Technology,Dalian 116024,China)

机构地区：[1]大连理工大学精密与特种加工教育部重点实验室,辽宁大连116024

出　　处：《电镀与精饰》2023年第1期71-79,共9页Plating & Finishing

摘　　要：采用脉冲电镀的方法快速制备耐磨损的超厚镍钨合金镀层,用以摩擦化学抛光金刚石,以实现金刚石的快速去除。采用正交实验研究了脉冲频率、平均电流密度、占空比对镀层组分、显微硬度、内应力和沉积速率的影响。最终在脉冲频率200 Hz、平均电流密度9 A/dm2和占空比0.8的条件下制备了显微硬度472.76 HV、内应力80.11 MPa、厚度为0.35 mm的镍钨合金镀层。经金刚石摩擦化学抛光实验验证,制备的镍钨合金抛光盘具有优异的抛光性能,相较于铸铁抛光盘,镍钨合金抛光盘具有更高的金刚石去除率(0.71μm/min)、更低的磨损量(0.16 g)和磨削比(94.25)。The pulse electrodeposition was used to develop the wear-resistant thick nickel-tungsten alloy which is used to dynamic friction polish diamond to realize rapid removal. The effects of pulse frequency,average current density and duty cycle on tungsten content,micro-hardness,internal stress and deposition rate were studied by orthogonal experiment. Finally,the nickel-tungsten alloy coating with hardness of 472.76 HV,internal stress of 80.11 MPa and thickness of 0.35 mm were fabricated under the deposition conditions of the pulse frequency of 200 Hz,the average current density of 9 A/dm2and the duty cycle of 0.8. The dynamic friction polishing diamond experiments showed that the nickeltungsten alloy polishing disc had excellent polishing performance. Comparing with cast iron polishing disc,the nickel-tungsten alloy polishing disc had higher diamond removal rate(0.71 μm/min),lower wear loss(0.16 g)and wear ratio(94.25).

关 键 词：金刚石 镍钨合金 脉冲电镀 摩擦化学抛光 

分 类 号：TQ153.2[化学工程—电化学工业]