采用叠片法的黄铜低温接触热阻测量  

Measurement of Cryogenic Thermal Contact Resistance of Brass by Lamination Method

作　　者：沈逸 曹家兴 黄永华[1] SHEN Yi;CAO Jiaxing;HUANG Yonghua(Institute of Refrigeration and Cryogenics,Shanghai Jiao Tong University,Shanghai 200240,China;Shanghai Precision Metrology and Testing Research Institute,Shanghai 201109,China)

机构地区：[1]上海交通大学制冷与低温工程研究所,上海200240 [2]上海精密计量测试研究所,上海201109

出　　处：《上海交通大学学报》2023年第1期76-83,共8页Journal of Shanghai Jiaotong University

基　　金：上海市科学技术委员会研发平台专项(19DZ2291500)资助项目。

摘　　要：以往低温接触热阻测量研究主要集中于液氮温区及以上,77 K以下温区的固体接触热阻数据鲜有报道.基于RDK-408D2型二级G-M低温制冷机,采用叠片法测量不同粗糙度和螺栓转矩下黄铜样品在10~30 K温区的接触热阻,并讨论不同因素对接触热阻的影响程度.结果表明:该温区黄铜接触面接触热阻值在6.89×10^(-4)~1.86×10^(-2)m^(2)·W/K之间,接触面粗糙度越小、温度越高、螺栓转矩越大,接触热阻就越小,结论与常规定性认识相符.该低温实验数据能够为相关低温应用设计中的连接热阻计算提供一定支持.Prior studies on cryogenic thermal contact resistance(TCR)measurement mainly focus on liquid nitrogen temperature region and above.There are limited solid TCR data in the lower temperature region.The present measurement is based on an RDK-408D2 two-stage G-M cryogenic refrigerator.By using the laminated method,the TCR data of brass samples in the temperature range of 10—30 K at different roughnesses and preloads are measured and the influence of different factors on TCR is discussed.The results show that the TCR of the brass contact surface in this temperature zone is between 6.89×10^(-4)and 1.86×10^(-2)m^(2)·W/K.With a smaller roughness of the contact surface,higher temperature,and greater pre-tightening force,the TCR becomes smaller.This behavior is consistent with the conventional qualitative understanding.The above cryogenic experimental data can provide certain support for the calculation of TCR for related cryogenic application design.

关 键 词：接触热阻 低温 制冷机 黄铜 叠片法 测量 

分 类 号：TB61[一般工业技术—制冷工程] O514.2[理学—低温物理]