X射线荧光光谱分析硅石稳定性差的原因分析及改进  

Analysis and Improvement of Poor Stability of Silica by X-ray Fluorescence Spectrometry

作　　者：张勇 卢祥宇 段东辉 王青竹 王春燕 Zhang Yong;Lu Xiangyu;Duan Donghui;Wang Qingzhu;Wang Chunyan(Wuhu Xinxing Ductile Iron Pipes Co.,Ltd.,Wuhu An hui,241000)

机构地区：[1]芜湖新兴铸管有限责任公司,安徽芜湖241000

出　　处：《山西冶金》2022年第8期3-5,共3页Shanxi Metallurgy

摘　　要：利用X射线荧光分析仪分析同一硅石标样时,数据出现波动,极差最大达到5个品位,原因为融样的样片存在缺陷(气泡或不熔物)。改进方法:以最佳试样助溶剂质量比为1∶20、最佳融样温度为1150℃和融样时间为15 min为条件制备标样样片,重新建立荧光分析曲线,再用化学湿法分析进行数据比对,结果理想。When the analyst of the testing center analyzed the same silica standard sample with X-ray fluorescence analyzer,the analysis data fluctuated,with a maximum range of 5 grades.The experimental results show that the unstable data is caused by defects(bubbles or non fusible substances)in the fused samples.At the same time,the improved method is explored.The best sample cosolvent mass ratio was 1:20,the best sample melting temperature was 1150℃and the sample melting time was 15 min.The standard sample was prepared under this experimental condition,the fluorescence analysis curve was re-established,and then the data were compared by manual chemical wet analysis.The results were ideal.

关 键 词：硅石 稳定性 改进 分析曲线 

分 类 号：TF046[冶金工程—冶金物理化学]