基于氧化石墨烯薄膜的极小漏率漏孔制备技术研究  

Preparation of Minimal Leak Rate Leak Elements Based on Graphene Oxide Membranes

作　　者：任国华[1] 郭崇武 孟冬辉[1] 闫荣鑫[1] 刘招贤 王莉娜 张子罡 李征[1] 肖庆生[1] REN Guohua;GUO Chongwu;MENG Donghui;YAN Rongxin;LIU Zhaoxian;WANG Lina;ZHANG Zigang;LI Zheng;XIAO Qingsheng(Beijing Institute of Spacecraft Environment Engineering,Beijing 100094,China)

机构地区：[1]北京卫星环境工程研究所,北京100094

出　　处：《真空与低温》2023年第1期51-57,共7页Vacuum and Cryogenics

基　　金：技术基础(JSJL2018203B016)。

摘　　要：氧化石墨烯薄膜(GO薄膜)由于含氧官能团的存在,对气体具有独特的渗透性能。研究氧化石墨烯薄膜的渗透性,可为超灵敏度检漏技术提供极小的漏率,解决小型真空器件的长寿命问题。采用真空抽滤的方法制作了GO薄膜,并以该薄膜作为流导元件制作漏孔;以氦质谱检漏仪为核心分析设备,建立漏孔漏率测试系统,分别研究了GO薄膜漏孔的漏率与GO薄膜厚度和两侧压力差的关系。结果表明,GO薄膜漏孔的漏率与薄膜两侧压力差呈线性关系。当GO薄膜厚度小于600 nm时,漏率与厚度呈指数关系;厚度在600~1800 nm时,漏率呈负线性关系。依据此特性,制备了极小漏率漏孔,可为研究超灵敏度检漏技术提供支持。Due to the existence of oxygen-containing functional groups,GO has unique permeability to gas.Leak element is an essential apparatus,which is used to accurately calibrate the ultralow leak rate.In this paper,graphene oxide(GO)membranes are assembled by typical vacuum filtration method and then assembled into leak elements.Gas permeance of GO membrane was measured by Leybord L300i helium mass spectrometer leak detector.The relationships between helium permeance and GO membrane thickness as well as the pressure differential across the membrane are studied.A critical GO membrane thickness is demonstrated:when the thickness is less than 600 nm,the leak rate of the GO membrane is inversely exponential to the membrane thickness,but the leak rate is negative linear to the thickness when the membrane is thicker than 600 nm.Based on the special properties of GO membrane,a standard leak element is developed.And the as-prepared GO membranes leak element is employed as an ultra-low standard leak.

关 键 词：氧化石墨烯 渗透性 流导元件 压力差 薄膜厚度 

分 类 号：TB774[一般工业技术—真空技术] V259[一般工业技术—材料科学与工程]