极间距和工作电压对阳极屏蔽电沉积铜定域性的影响  

Effects of interelectrode gap and operating voltage on localized electrodeposition of copper using shielding anode

作　　者：罗龚 陈茂琳 袁原 蔡佳琪 林依璇 李书弘 李宁 LUO Gong;CHEN Maolin;YUAN Yuan;CAI Jiaqi;LIN Yixuan;LI Shuhong;LI Ning(School of Mechanical and Electrical Engineering,Guangdong University of Petrochemical Technology,Maoming 525000,China;School of Chemistry and Chemical Engineering,Harbin Institute of Technology,Harbin 150001,China;College of Chemistry,Guangdong University of Petrochemical Technology,Maoming,525000,China)

机构地区：[1]广东石油化工学院机电工程学院,广东茂名525000 [2]哈尔滨工业大学化工与化学学院,黑龙江哈尔滨150001 [3]广东石油化工学院化学学院,广东茂名525000

出　　处：《电镀与涂饰》2023年第1期35-41,共7页Electroplating & Finishing

基　　金：广东省特色创新自然科学类项目(2021KTSCX079);广东省茂名市科技计划项目(2021019);广东石油化工学院人才引进项目(2019rc06);广东省教育厅省级大学生创新创业训练项目(73322077)。

摘　　要：设计并制作了阳极屏蔽电沉积系统,采用5,5-二甲基乙内酰脲(DMH)体系镀铜液,在温度(23.5±1)℃下电沉积30 s,研究了极间距和工作电压的变化对定域电沉积效果的影响。结果表明,阳极屏蔽定域沉积区域随极间距和工作电压的增大而扩大,且极间距变化对沉积图案定域性的影响大于工作电压变化带来的影响。Localized electrodeposition of copper was conducted in a 5,5-dimethylhydantoin(DMH) bath at temperature(23.5 ± 1) ℃ for 30 s using a home-designed electrodeposition system with a shielding anode. The effects of interelectrode gap and operating voltage on the localized electrodeposition were studied. The results showed that the localized deposition region when using a shielding anode expands with the increasing of interelectrode gap or operating voltage. The variation in interelectrode gap has greater impact on the localized deposition area than the variation in operating voltage.

关 键 词：铜 定域性电沉积 阳极屏蔽 极间距 工作电压 5 5-二甲基乙内酰脲 

分 类 号：TQ153.14[化学工程—电化学工业]