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作 者:杨涵 金凡亚[2] 冯军 李必文[1] 翦奉林 但敏[2] 陈伦江[2] 黄熠 唐国庆 YANG Han;JIN Fanya;FENG Jun;LI Biwen;JIAN Fenglin;DAN Min;CHEN Lunjiang;HUANG Yi;TANG Guoqing(School of Mechanical Engineering,University of South China,Hengyang 421001,China;Southwest Institute of Physics of Nuclear Industry,Chengdu 610041,China)
机构地区:[1]南华大学机械工程学院,湖南衡阳421001 [2]核工业西南物理研究院,四川成都610041
出 处:《电镀与涂饰》2023年第2期7-13,共7页Electroplating & Finishing
基 金:国家磁约束核聚变能发展研究专项(2018YFE0313100)。
摘 要:采用扫描电镜(SEM)、X射线衍射仪(XRD)和维氏硬度仪对1060纯铝微弧氧化膜的表面形貌、物相构成和显微硬度进行分析,研究了不同电流密度下氧化膜中α-Al_(2)O_(3)相的形成及其表面组织结构的演变规律。结果表明,随着电流密度由2.5 A/dm^(2)增大至20 A/dm^(2),α-Al_(2)O_(3)和γ-Al_(2)O_(3)在膜层中的X射线衍射特征峰强度逐渐上升,α-Al_(2)O_(3)相对于γ-Al_(2)O_(3)的质量分数呈上升趋势,氧化膜表面孔径增大,孔洞先增多后减少,熔融堆积物增多,裂纹横向生长加快。当电流密度为20 A/dm^(2)时,α-Al_(2)O_(3)相的生成速率比γ-Al_(2)O_(3)相的生成速率高,α-Al_(2)O_(3)的结晶程度较好,α-Al_(2)O_(3)相对于γ-Al_(2)O_(3)的质量分数最高(为47.87%),膜层的显微硬度达到679 HV。The surface morphology,phase constitution,and microhardness of microarc oxidation (MAO) film on pure aluminum 1060 were analyzed by using scanning electron microscope (SEM),X-ray diffractometer (XRD),and Vickers hardness tester.The formation of α-Al_(2)O_(3)phase in MAO film and the evolution of its surface microstructure at different current densities were studied.The results showed that with the increasing of current density from 2.5 A/dm^(2) to 20 A/dm^(2),the characteristic XRD peak intensities of α-Al_(2)O_(3)and γ-Al_(2)O_(3)in the film were increased gradually,the mass fraction ofα-Al_(2)O_(3)with respect to γ-Al_(2)O_(3)in the film was increased,the size of pores on the film surface was increased,the number of pores was increased initially and then decreased,the melt accumulation was increased,and the growth rate of transverse cracks was increased.When the current density was 20 A/dm^(2),the formation rate of α-Al_(2)O_(3)was faster than that of γ-Al_(2)O_(3),the crystallization degree of α-Al_(2)O_(3)became better,the mass fraction of α-Al_(2)O_(3)with respect to γ-Al_(2)O_(3)was the highest (up to 47.87%),and the microhardness of the MAO film reached 679 HV.
关 键 词:纯铝 微弧氧化 电流密度 氧化铝 相结构 表面形貌
分 类 号:TG174.451[金属学及工艺—金属表面处理]
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