Direct laser writing breaking diffraction barrier based on two-focus parallel peripheralphotoinhibition lithography  

作　　者：Dazhao Zhu Liang Xu Chenliang Ding Zhenyao Yang Yiwei Qiu Chun Cao Hongyang He Jiawei Chen Mengbo Tang Lanxin Zhan Xiaoyi Zhang Qiuyuan Sun Chengpeng Ma Zhen Wei Wenjie Liu Xiang Fu Cuifang Kuang Haifeng Li Xu Liu 

机构地区：[1]Zhejiang Lab,Research Center for Intelligent Chips and Devices,Hangzhou,China [2]Zhejiang University,College of Optical Science and Engineering,State Key Laboratory of Modern Optical Instrumentation,Hangzhou,China [3]Zhejiang University,College of Control Science and Engineering,State Key Laboratory of Industrial Control Technology,Hangzhou,China [4]Zhejiang Lab,Research Center for Humanoid Sensing,Zhejiang Lab,Hangzhou,China

出　　处：《Advanced Photonics》2022年第6期56-63,共8页先进光子学（英文）

基　　金：the National Key Research and Development Program of China(Grant No.2021YFF0502700);the National Natural Science Foundation of China(Grant Nos.62105298,52105565,and 22105180);China Postdoctoral Science Foundation(Grant Nos.2020M671823 and 2020M681956);the Natural Science Foundation of Zhejiang Province,China(Grant Nos.LD21F050002,LQ22F050017,and LQ22F050015);the Major Scientific Project of Zhejiang Lab,China(Grant No.2020MC0AE01).

摘　　要：Direct laser writing(DLW)enables arbitrary three-dimensional nanofabrication.However,the diffraction limit poses a major obstacle for realizing nanometer-scale features.Furthermore,it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems,which cannot perform high-throughput lithography.To overcome these challenges,a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study,based on two-photon polymerization DLW.The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures.The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.

关 键 词：optical fabrication parallel direct laser writing peripheral-photoinhibition diffraction barrier breaking 

分 类 号：TN249[电子电信—物理电子学]