Digitally tunable optical delay line based on thinfilm lithium niobate featuring high switching speed and low optical loss  被引量:3

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作  者:WEI KE YANMEI LIN MINGBO HE MENGYUE XU JIAXIANG ZHANG ZHONGJIN LIN SIYUAN YU XINLUN CAI 

机构地区:[1]State Key Laboratory of Optoelectronic Materials and Technologies,School of Electronics and Information Technology,Sun Yat-sen University,Guangzhou 510275,China [2]State Key Laboratory of Functional Materials for Informatics,Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences,Shanghai 200092,China [3]Department of Electrical and Computer Engineering,The University of British Columbia,Vancouver,British Columbia V6T 1Z4,Canada

出  处:《Photonics Research》2022年第11期2575-2583,共9页光子学研究(英文版)

基  金:National Key Research and Development Program of China(2019YFA0705004,2019YFB1803901);Key R&D Program of Guangdong Province(2018B03032900);Local Innovative and Research Teams Project of Guangdong Pearl River Talents Program(2017BT01X121)。

摘  要:A tunable optical delay line(ODL) featuring high switching speed and low optical loss is highly desirable in many fields. Here, based on the thin-film lithium niobate platform, we demonstrate a digitally tunable on-chip ODL that includes five Mach–Zehnder interferometer optical switches, four flip-chip photodetectors, and four delayline waveguides. The proposed optical switches can achieve a switching speed of 13 ns and an extinction ratio of34.9 dB. Using a modified Euler-bend-based spiral structure, the proposed delay-line waveguide can simultaneously achieve a small footprint and low optical propagation loss. The proposed ODL can provide a maximum delay time of 150 ps with a resolution of 10 ps and feature a maximum insertion loss of 3.4 dB.

关 键 词:TUNABLE OPTICAL INTERFEROMETER 

分 类 号:O43[机械工程—光学工程]

 

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