不同因素对电沉积镍-钨合金镀层性能的影响  

Factors affecting the properties of electroplated Ni–W alloy coating

作　　者：赵显蒙 李长青 鞠辉 孙淑伟 ZHAO Xianmeng;LI Changqing;JU Hui;SUN Shuwei(Unit of 32178,Beijing 100012,China;Hunan Nanofilm New Material Technology Co.,Ltd.,Changsha 410000,China)

机构地区：[1]中国人民解放军32178部队,北京100012 [2]湖南纳菲尔新材料科技股份有限公司,湖南长沙410000

出　　处：《电镀与涂饰》2023年第5期14-18,共5页Electroplating & Finishing

摘　　要：采用直流电沉积法在低碳钢表面制备了Ni-W合金镀层。通过单因素实验研究了钨酸钠质量浓度、温度、pH和阴极电流密度对镀速及镀层钨质量分数、内应力和抗高温氧化性能的影响,得到较优的工艺条件为:NiSO_(4)·6H_(2)O 20 g/L,Na_(2)WO_(4)·2H_(2)O40 g/L,C_(6)H_(8)O_(7)·2H_(2)O 45 g/L,H_(3)PO_(4)10 g/L,温度75℃,pH 7.0,电流密度10 A/dm^(2)。在该条件下镀速为17μm/h,所得的Ni-W合金镀层平整致密,内应力为84 MPa,与基体结合紧密,抗高温氧化性能良好。Direct-current electrodeposition of Ni-W alloy coating was carried out with low-carbon steel as substrate.The effects of mass concentration of sodium tungstate,temperature,pH,and cathodic current density on deposition rate,and mass fraction of tungsten,internal stress,and high-temperature oxidation resistance of Ni-W alloy coating were analyzed.The process parameters were optimized as follows:NiSO_(4)·6H_(2)O 20 g/L,Na_(2)WO_(4)·2H_(2)O 40 g/L,C_(6)H_(8)O_(7)·2H_(2)O 45 g/L,H_(3)PO_(4)10 g/L,temperature 75℃,pH 7.0,and current density 10 A/dm^(2).The deposition rate was 17μm/h under the optimal conditions,and the Ni-W alloy coating obtained thereunder was smooth,compact,and well-adhered to the substrate with an internal stress of 84 MPa and good antioxidation property at high temperatures.

关 键 词：镍-钨合金 电沉积 镀速 内应力 抗高温氧化 

分 类 号：TQ153.2[化学工程—电化学工业]