砷化镓芯片行业含砷废水深度处理中试研究  

A Pilot Study on Advanced Treatment of Arsenic‑containing Wastewater in Gallium Arsenide Chip Industry

作　　者：雷成 黄文凤 章慧 张亚明 唐彤 舒俊 黄莉 LEI Cheng;HUANG Wen‑feng;ZHANG hui;ZHANG Ya‑ming;TANG Tong;SHU Jun;HUANG Li(Sichuan Entech Environment Technology Co.Ltd.,Mianyang 621000,China)

机构地区：[1]四川恒泰环境技术有限责任公司,四川绵阳621000

出　　处：《中国给水排水》2023年第5期101-105,共5页China Water & Wastewater

基　　金：绵阳市科技成果转化项目(2021ZYZF3002)。

摘　　要：某砷化镓芯片生产厂家的含砷废水经石灰-铁盐法处理后,出水中砷浓度仍有0.2 mg/L,未达到回用水的要求。采用含有活性炭三维电极的一体化除砷装置对该含砷废水进行中试规模的深度处理,结果表明,装置在药剂投加量为0.10 g/L、反应时间为60 min、pH为9的最佳条件下运行30 d后,对废水中砷的去除率基本稳定在98%以上,且出水中砷浓度低于0.005 mg/L,达到了《生活饮用水卫生标准》(GB 5749—2006),可满足回用要求。The arsenic concentration in the wastewater from a gallium arsenide chip manufacturer was still 0.2 mg/L after the treatment of lime-ferric salt process,which did not meet the requirement of reuse water.A pilot‑scale integrated arsenic removal device containing activated carbon three‑dimensional electrode was used for the advanced treatment of arsenic‑containing wastewater.The optimal operational parameters were as follows:chemicals dosage of 0.10 g/L,reaction time of 60 min and pH of 9.After 30 days of operation with these parameters,the removal rate of arsenic in the wastewater basically stabilized above 98%,and the arsenic concentration in the effluent was less than 0.005 mg/L,which met the limit specified in Standards for Drinking Water Quality(GB 5749-2006)and could be reused to production.

关 键 词：砷化镓芯片 含砷废水 深度处理 电化学 三维电极 一体化装置 

分 类 号：TU992[建筑科学—市政工程]