氙气中全杂质的分析方法研究  

Research on Analytical Methods of Total Impurities in Xenon

作　　者：刘汉兵 万芳 查玲 韩曦 杨艳 程效明 孙超 郁光 方华 LIU Hanbing;WAN Fang;ZHA Ling;HAN Xi;YANG Yan;CHENG Xiaoming;SUN Chao;YU Guang;FANG Hua(Wisco Gases Co.,Ltd.,Wuhan 430083,China;Shanghai Huaai Chromatography Analysis Co.,Ltd.,Shanghai 200940,China)

机构地区：[1]武汉钢铁集团气体有限责任公司,湖北武汉430083 [2]上海华爱色谱分析技术有限公司,上海200940

出　　处：《低温与特气》2023年第1期28-31,共4页Low Temperature and Specialty Gases

摘　　要：建立了一种利用氦离子气相色谱仪检测氙气中全杂质的分析方法,通过色谱柱选择切换、反吹放空等技术,采用最佳色谱仪工作参数及阀切时间,解决了分离氧气和氩气,分离四氟化碳、六氟乙烷和六氟化硫的分析难点。结果表明,该分析方法大大提高了氙气中杂质的检测效率及准确度,能够检测氙气中10-9级微量杂质。The analytical method for detecting total impurities in xenon by using helium ion gas chromatograph was established. By using technologies such as column selection and switching, backflushing and venting, and exploring the optimal working parameters of the chromatograph and valve cutting time, which solved the analytical difficulty of separating oxygen and argon, carbon tetrafluoride, hexafluoroethane and sulfur hexafluoride. The results show that this analysis method greatly improves the detection efficiency and accuracy of xenon, and also can detect 10-9grade trace impurities in xenon.

关 键 词：氦离子气相色谱仪 高纯氙气 气相色谱法 

分 类 号：O613.15[理学—无机化学]