影响基于等厚干涉原理测量膜厚精度的因素分析  

Analysis on the Factors Affecting the Measurement Accuracy of Film Thickness Based on the Principle of Equal-Thickness Interference

作　　者：王义全[1] 陈笑[1] 邹斌[1] 蔡园园[1] 黎仪艺 李传波 彭洪尚[1] WANG Yiquan;CHEN Xiao;ZOU Bin;CAI Yuanyuan;LI Yiyi;LI Chuanbo;PENG Hongshang(College of Science,Minzu University,Beijing 100081)

机构地区：[1]中央民族大学理学院,北京100871

出　　处：《物理通报》2023年第4期24-27,共4页Physics Bulletin

基　　金：国家自然科学基金项目,项目编号:61975247,61675238;中央民族大学优秀教学成果培育项目,项目编号:CG2008。

摘　　要：基于光学干涉原理的薄膜测量技术是重要的光电检测技术之一.该测量方法可获得较高的测量精度.但是在实际干涉测量中,膜厚测量的精度与所用光束的物理特性以及膜厚本身有较大关系.基于薄膜干涉的基本原理,分析了光束的发散角、薄膜厚度以及光束的入射角对基于薄膜干涉测长结果的影响,这对学生正确理解基于干涉的测量原理,掌握正确的测量方法,提高测量精度具有一定的指导意义.Thin film measurement technology based on the principle of optical interference is one of the important photoelectric detection technologies.This measurement method can obtain higher measurement accuracy.However,the accuracy of film thickness measurement depends on the beam characteristics and the film thickness.Based on the basic principles of thin film interference,it systematically analyzes the impact of beam collimation,incident angle,and film thickness on the results of length measurement based on thin film interference.It is significant for students to accurately understand the interference-based measurement principle,master the correct measurement method as well as improving measurement accuracy.

关 键 词：等厚干涉 等倾干涉 测量精度 

分 类 号：O436.1[机械工程—光学工程]