光纤光栅外腔激光器光学薄膜的研制  

Design and fabrication of an optical film for fiber bragg grating external cavity diode lasers

作　　者：游道明 谭满清[1,2] 郭文涛 曹营春[1] 王子杰 杨秋蕊[1] 万丽丽 王鑫 刘珩[1] YOU Dao-ming;TAN Man-qing;GUO Wen-tao;CAO Ying-chun;WANG Zi-jie;YANG Qiu-rui;WAN Li-li;WANG Xin;LIU Heng(State Key Laboratory of Integrated Optoelectronics,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China;School of Materials Science and Opto-electronics Technology,University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院半导体研究所集成光电子学国家重点实验室,北京100083 [2]中国科学院大学材料科学与光电技术学院,北京100049

出　　处：《中国光学（中英文）》2023年第2期447-457,共11页Chinese Optics

基　　金：国家电网公司科技项目(No.5700-202058482A-0-0-00)。

摘　　要：腔面光学薄膜是光纤光栅外腔激光器(ECL)的关键结构,平面波方法(PWM)被广泛应用于腔面光学薄膜的设计,然而该设计在ECL中的实际应用效果往往并不理想。本文在使用PWM方法时通过时域有限差分法分析其中的原因,并考虑腔面尺寸和结构影响。仿真结果显示,PWM设计存在反射率差和反射曲线偏移等问题,实际的反射特性显著偏离设计值。因此本文重点优化了薄膜设计,并采用磁控溅射工艺镀膜。测量结果显示,优化后增透膜的反射率降低了30%,高反膜反射率增至96%以上,所制备的ECL的光纤输出功率超过650 mW。本文研究结果为ECL和其他半导体光电子器件的腔面光学薄膜研制提供了参考。The cavity surface optical film is one of the most crucial components of the fiber bragg grating External Cavity diode Laser(ECL).Although,the Plane Wave Method(PWM)is widely used in the optical film preparation,it is not an ideal design method when applied in ECL preparation.The Finite-Difference Time-Domain(FDTD)method is used to analyze this problem by taking the effect of facet dimensions and structure into account.According to the simulation,PWM suffers from poor reflectivity and deviation of the reflection curve,which significantly affects performance.Therefore,the optical film design is optimized and verified by experiments.Magnetron sputtering is used to fabricate the optical film,which is then applied to ECL.The measurement results show that the reflectivity of Anti-Reflection(AR)film is reduced by 30%after optimization,while the reflectivity of High-Reflection(HR)film increased to 96%.The prepared ECL’s fiber output power exceeds 650 mW.In this paper,the optical film suitable for ECL is designed and fabricated,and provides a reference for optical films in ECLs and other semiconductor optoelectronic devices.

关 键 词：外腔激光器 光学薄膜 时域有限差分 腔面镀膜 

分 类 号：TN248.4[电子电信—物理电子学]