Nanotribological properties and scratch resistance of MoS_(2)bilayerona SiO_(2)/Si substrate  

作　　者：Si-hwan KIM Hyo-sok AHN 

机构地区：[1]Department of Transdisciplinary Studies,Seoul National University,Seoul 08826,Republic of Korea [2]Department of Manufacturing Systems and Design Engineering,Seoul National University of Science and Technology,Seoul 08826 Republic of Korea

出　　处：《Friction》2023年第1期154-164,共11页摩擦（英文版）

基　　金：This study was supported by the Research Program funded by the SeoulTech(Seoul National University of Science and Technology,Republic of Korea).

摘　　要：The tribological properties and scratch resistance of MoS_(2)bilayer deposited on SiO_(2)/Si substrates prepared via chemical vapor deposition are investigated.Friction force microscopy(FFM)is employed to investigate the friction and wear properties of the MoS_(2)bilayer at the nanoscale by applying a normal load ranging from 200 to 1,000 nN.Scratch resistance is measured using the scratch mode in FFM based on a linearly increasing load from 100 to 1,000 nN.Kelvin probe force microscopy(KPFM)is performed to locally measure the surface potential in the tested surface to qualitatively measure the wear/removal of Mos,layers and identify critical loads associated with the individual failures of the top and bottom layers.The analysis of the contact potential difference values as well as that of KPFM,friction,and height images show that the wear/removal of the top and bottom layers in the MoS_(2)bilayer system occurred consecutively.The FFM and KPFM results show that the top MoS_(2)layer begins to degrade at the end of the low friction stage,followed by the bottom layer,thereby resulting in a transitional friction stage owing to the direct contact between the diamond tip and SiO_(2)substrate.In the stable third stage,the transfer of lubricious MoS_(2)debris to the tip apex results in contact between the MoS_(2)-transferred tip and SiO_(2).Nanoscratch test results show two ranges of critical loads,which correspond to the sequential removal of the top and bottom layers.

关 键 词：chemical vapor deposition(CVD)-grown MoS bilayer friction force microscopy(FFM) nanoscratch test Kelvin probe force microscopy(KPFM) scratch resistance 

分 类 号：TB332[一般工业技术—材料科学与工程] TQ323.7[化学工程—合成树脂塑料工业]