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作 者:刘姣[1,2] 李国希[1] 朱本峰 杜小青 杨雨萌 卫国英[3] 张昭[2] Jiao LIU;Guo-xi LI;Ben-feng ZHU;Xiao-qing DU;Yu-meng YANG;Guo-ying WEI;Zhao ZHANG(College of Chemistry and Chemical Engineering,Hunan University,Changsha 410082,China;Center of Chemistry for Frontier Technologies,Department of Chemistry,Zhejiang University,Hangzhou 310027,China;College of Materials and Chemistry,China Jiliang University,Hangzhou 310018,China;School of Materials Science and Energy Engineering,Foshan University,Foshan 528000,China)
机构地区:[1]湖南大学化学化工学院,长沙410082 [2]浙江大学化学系化学前瞻技术研究中心,杭州310027 [3]中国计量大学材料与化学学院,杭州310018 [4]佛山科技大学材料科学与能源工程学院,佛山528000
出 处:《Transactions of Nonferrous Metals Society of China》2023年第3期951-957,共7页中国有色金属学报(英文版)
基 金:financially supported by the National Natural Science Foundation of China (Nos. 51771173, 52001300)。
摘 要:采用电化学噪声、扫描电子显微镜和掠射角X射线衍射等技术,研究电沉积电流密度(J_(k))和镀液温度对Ni沉积层结构和电化学噪声能量(E^(D))的影响规律,并详细探讨沉积层结构与E^(D)之间的关系。结果表明:E^(D)主要反映电极表面状态的剧烈变化程度或局部阴极的反应速率,而不是反映整体阴极的反应速率;与J_(k)密切相关的Ni镀层初始成核/生长机制对E^(D)产生显著影响。晶粒在异质基底上的成核(新相的形成)/生长过程对E^(D)的影响远远大于薄膜晶粒的后续同质生长过程对E^(D)的影响,能够加速电极表面状态剧烈变化的因素都能导致E^(D)值的增加。The effects of current density(J_(k))and bath temperature on the structure of deposition layer of nickel and electrochemical noise energy(E^(D))are studied,and the relationship between the structure of the deposit and E^(D) is also discussed in detail using electrochemical noise technique in coupled with the scanning electron microscopy and the glancing angle X-ray diffraction techniques.The results show that E^(D) theoretically mainly reflects the severity or rate of the local cathodic reaction rather than the integral cathodic reaction,and is markedly influenced by the electroplating current density(J_(k))-depended nucleation/growth kinetics of the nickel deposit film.The proceeding of the nucleation(or the formation of new phase)/growth process of crystal nucleus on a foreign substrate possesses much more effect on E^(D) value than the subsequent homogenous growth of the already formed film particles,and the factors which can accelerate the drastic change of the electrode surface state should result in large E^(D) value.
分 类 号:TG174.4[金属学及工艺—金属表面处理]
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