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作 者:周军 曹曾[1] 曹诚志 黄向玫[1] 高霄雁[1] 胡毅 ZHOU Jun;CAO Zeng;CAO Cheng-zhi;HUANG Xiang-mei;GAO Xiao-yan;HU Yi(Southwestern Institute of Physics,Chengdu 610041,China)
出 处:《真空》2023年第2期45-50,共6页Vacuum
基 金:国家磁约束核聚变能研究专项(2017YFE0301305)。
摘 要:为了对HL-2A装置升级改造后的器壁处理效果展开分析,使用四极质谱计对HL-2A装置壁处理过程中或壁处理前后的残余气体进行了质谱测量。利用粒子平衡方程和质谱图变化分析了直流辉光放电清洗过程中的气体成分变化。研究了HL-2A装置壁处理的性能并优化了He+D_(2)-GDC的氦氘比例参数。结果表明:HL-2A装置真空室烘烤除气后,残余气体中H2O所占百分比由烘烤前的92%降至56%,真空室真空度达到2.2×10^(-5)Pa;在不同阶段利用H2-GDC、He-GDC、He+D_(2)-GDC进行壁处理消除了真空室内部件升级改造对壁处理造成的不利影响,保障了HL-2A装置等离子体放电实验的开展。In order to analyze the wall conditioning effect of HL-2A device after its upgrading, the residual gas during or before and after wall conditioning of HL-2A device was measured by quadrupole mass spectrometer, and the effect of wall conditioning was analyzed. The change of gas component during DC glow discharge cleaning was analyzed by particle equilibrium equation and mass spectrogram. The performance of the wall conditioning of HL-2A device was studied and the helium deuterium ratio parameter of the He +D_(2)-GDC was optimized. The results show that the percentage of H2O in the residual gas in HL-2A decreases from 92% to 56%, and the vacuum of the vacuum vessel reaches 2.2 ×10^(-5)Pa. In different stages, H2-GDC,He-GDC and He+D_(2)-GDC eliminate the adverse effects of vacuum inner parts upgrading on wall conditioning,and ensure the plasma discharge experiment of HL-2A device.
关 键 词:HL-2A装置 壁处理 质谱分析 辉光放电清洗 硅化
分 类 号:TL628[核科学技术—核技术及应用]
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