半导体光催化剂光腐蚀的机理及抑制策略  

The Mechanism and Strategies of Photocorrosion Inhibition of Semiconductor Photocatalysts

作　　者：罗志珊 方圆梦 黄建辉 LUO Zhishan;FANG Yuanmeng;HUANG Jianhui(Fujian Provincial Key Laboratory of Ecology-Toxicological Effects&Control for Emerging Contaminants,Putian Fujian 351100,China;Key Laboratory of Ecological Environment and Information Atlas,Fujian Provincial University,Putian Fujian 351100,China;School of Environmental and Biological Engineering,Putian University,Putian Fujian 351100,China;State Key Laboratory of Photocatalysis on Energy and Environment,Fuzhou Fujian 350116,China;College of Environment&Safety Engineering,Fuzhou Fujian 350116,China)

机构地区：[1]福建省新型污染物生态毒理效应与控制重点实验室,福建莆田351100 [2]福建省高校生态环境及其信息图谱重点实验室,福建莆田351100 [3]莆田学院环境与生物工程学院,福建莆田351100 [4]福州大学能源与环境光催化国家重点实验室,福建福州350116 [5]福州大学环境与安全工程学院,福建福州350116

出　　处：《莆田学院学报》2023年第2期1-10,共10页Journal of putian University

基　　金：国家自然科学基金青年科学基金项目(22102030);福建省自然科学基金资助项目(2022J011165);福州大学能源与环境光催化国家重点实验室开放课题(SKLPEE-KF202315);莆田学院科技项目(2022052)。

摘　　要：综述了半导体光催化剂发生光腐蚀的机理,并总结了抑制光腐蚀的策略,包括调控半导体光催化剂的晶粒大小、形貌结构、结晶度等物理性质,以及掺杂杂原子、构建异质结结构、半导体复合、与碳基材料耦合、调节反应条件等方面,旨在深入揭示光腐蚀的发生途径和作用原理,为有效解决半导体光催化剂的光腐蚀问题提供指导意见。最后,总结和展望未来光催化剂光腐蚀的抑制策略。The mechanism of photocorrosion in semiconductor photocatalysts is reviewed and the strategies of inhibiting photocorrosion are summarized,including regulating such physical properties as grain size,morphology and crystallinity,doping heteroatoms,constructing heterojunctions,compositing with semiconductors,coupling with carbon-based materials and adjusting reaction conditions.We attempt to reveal the pathway and mechanism of photocorrosion and provide some guidance for effectively solving the problem of photocorrosion in semiconductor photocatalysts.Finally,we also prospect the strategies of inhibiting photocorrosion in the future.

关 键 词：半导体 光催化剂 光腐蚀 光腐蚀机理 抗光腐蚀 

分 类 号：O643.36[理学—物理化学]