低温液氙无损存储的实验研究与模型分析  

Experimental study and model simulation for non-vented storage of cryogenic liquid xenon

作　　者：雷卓群 王秀丽 巨永林[1] 谢世纪 Lei Zhuoqun;Wang Xiuli;Ju Yonglin;Xie Shiji(Institute of Refrigeration and Cryogenics,Shanghai Jiao Tong University,Shanghai 200240,China)

机构地区：[1]上海交通大学制冷与低温工程研究所,上海200240

出　　处：《低温与超导》2023年第3期63-68,共6页Cryogenics and Superconductivity

基　　金：国家重点研发计划(2016YFA0400301);上海市科学技术委员会重点基础研究项目(18JC1410200)资助。

摘　　要：为研究吨级低温液氙在静置存储过程中的压力与温度变化情况,选用液氩作为介质代替昂贵的液氙进行了实验测试,并使用三区模型进行模拟计算。模拟了在容积为6.7 m^(3)的简化低温储罐模型中,将初始液相温度为87 K,压力为0.1 MPa的液氩静置9天,储罐内压力、温度的变化情况。结果显示,随着外部热量的进入,储罐压力随时间逐渐上升但并非线性增长,压力的变化率逐渐增大。为低温液氙、液氩的无损存储研究提供了参考。To study the variations of the internal pressure and temperature of liquid xenon cryogenic tank with tons-scale, liquid argon was used as the substitute media instead of expensive liquid xenon for experiment. The three-zone model was used to simulate the storage process of liquid xenon. The temperature and pressure performance of liquid xenon in a 6.7 m^(3) cryogenic storage tank was calculated for 9 days with the initial condition temperature and pressure of 87 K and 0.1 MPa. The experimental and calculation results show that the internal pressure gradually increases with time but not linearly increases while the rate of pressure change gradually increase with the external heat loads. It could provide reference for the study of non-vented storage of cryogenic liquid xenon and liquid argon.

关 键 词：静置存储 稀有气体 三区模型 

分 类 号：TB658[一般工业技术—制冷工程]