400 mm口径4×2组合式片状放大器在线洁净度实验研究  

Experimental study on online cleanliness of the 400 mm aperture 4×2 combined slab amplifier

作　　者：吴文龙[1] 刘勇[1] 强永发 王振国[1] 熊迁[1] 李珂[1] 刘建国[1] 王琳[1] 林东晖[1] 陈林[1] 苗心向[1] 姚轲[1] Wu Wenlong;Liu Yong;Qiang Yongfa;Wang Zhenguo;Xiong Qian;Li Ke;Liu Jianguo;Wang Lin;Lin Donghui;Chen lin;Miao Xinxiang;Yao Ke(Laser Fusion Research Center,CAEP,Mianyang 621900,China)

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《强激光与粒子束》2023年第6期41-44,共4页High Power Laser and Particle Beams

基　　金：中国工程物理研究院激光聚变研究中心青年人才基金项目(RCFPD6-2022-7)。

摘　　要：在氙灯放电泵浦过程中,片状放大器片腔内材料在高强度氙灯光辐照下,存在显著的热解过程,产生大量的μm级悬浮粒子。针对放大器在线洁净度控制,采取了包括选用有利于洁净控制的材料、消除盲孔与焊缝、深度酸洗刻蚀、高压喷淋清洗和最终的光照清洗等系列有效措施。实验研究结果表明:经过100发次光照清洗,片腔内气溶胶颗粒处于300~1000之间,接近美国国家点火装置(NIF)洁净水平;发次运行完成后,利用约0.4 m/s的氮氧混合气体对放大器腔体进行吹扫,气溶胶颗粒在2 min内可恢复至0值。In the discharge pumping process of xenon lamp,there is a significant pyrolysis process of the materials in the cavity of the slab amplifier under the irradiation of high intensity xenon light,which produces a large number of micron sized suspended particles.For the online cleanliness control of the amplifier,a series of effective measures were taken,including the selection of materials conducive to the cleanliness control,elimination of blind holes and welds,deep pickling and etching,high-pressure spray cleaning and final light cleaning.The experimental results show that after 100 times of light cleaning,the aerosol particles in the chamber are between 300 and 1000,which is close to the cleanliness level of the American National Ignition Facility(NIF)Project;After the operation of the generator is completed,the amplifier chamber is purged with a mixture of nitrogen and oxygen of about 0.4 m/s,and the aerosol particles can recover to zero within 2 minutes.

关 键 词：片状放大器 洁净度 气溶胶 光学表面损伤 

分 类 号：TN248.1[电子电信—物理电子学] O368[理学—流体力学]