脉冲激光清洗绝缘子污秽的振动与烧蚀机制分析  

Analysis of Vibration and Ablative Mechanism of Insulator Pollution After Pulsed Laser Cleaning

作　　者：方春华[1] 侯正宇 王一清 许瑶 崔岩 庄立 袁田 Fang Chunhua;Hou Zhengyu;Wang Yiqing;Xu Yao;Cui Yan;Zhuang Li;Yuan Tian(College of Electrical Engineering and New Energy,China Three Gorges University,Yichang 443002,Hubei,China;China Electric Power Research Institute,Wuhan 430074,Hubei,China)

机构地区：[1]三峡大学电气与新能源学院,湖北宜昌443002 [2]中国电力科学研究院有限公司,湖北武汉430074

出　　处：《应用激光》2023年第3期80-89,共10页Applied Laser

摘　　要：脉冲激光清洗绝缘子表面污秽时,作用机制主要有振动和烧蚀两种机制,但不同激光参数下实际的作用机制会有所差异。通过COMSOL建立热-应力耦合有限元模型模拟温度场和应力场,探究脉冲激光扫描一个周期脉冲功率不同时的振动和烧蚀机制及其清洗效果,并通过激光清洗试验,验证仿真结果的可行性。仿真结果表明,振动与烧蚀机制共同作用的污秽去除阈值约为123 W,振动量与烧蚀量都随着脉冲功率的增大而增大,在150 W时清洗深度为污秽厚度的40%,在200 W时清洗深度达到污秽厚度的92%;在250 W时清洗机制达到临界状态,清洗深度达到污秽厚度的100%;大于250 W后为烧蚀机制主导,以300 W为例,绝缘子有明显损坏。试验结果表明,在设备功率为200 W时,脉冲激光对绝缘子表面污秽有明显的去除效果,表面污秽向外喷溅,并伴随明显烧蚀现象;绝缘子基底只有少量污秽残留,未见损伤。Vibration and ablation are two main mechanisms of pulsed laser cleaning insulator surface pollution,but the actual mechanism will be different under different laser parameters.A thermo-stress coupled finite element model was established by COMSOL to simulate temperature and stress fields,and the vibration and ablation mechanism and cleaning effect of pulse laser scanning with different pulse power during one cycle were explored.The feasibility of simulation results was verified by laser cleaning experiment.The simulation results show that the pollution removal threshold of vibration and ablation mechanism is about 123 W,and both vibration and ablation increase with the increase of pulse power.At 150 W,the cleaning depth is 40% of the pollution thickness,and at 200 W,it reaches 92% of the pollution thickness.At 250 W,the cleaning mechanism reaches the critical state and the cleaning depth reaches the cleaning thickness.Above 250 W,the ablative mechanism dominates.Taking 300 W as an example,the insulator has obvious damage.Experimental results show that when the power of the equipment is 200 W,the pulsed laser can remove the pollution on the insulator surface obviously,and the pollution on the insulator surface bounces under the force and has obvious gasification phenomenon.Only a small amount of pollution remained in the insulator base,and no damage was observed.

关 键 词：脉冲功率 有限元法 清洗机制 振动机制 烧蚀机制 

分 类 号：TM216[一般工业技术—材料科学与工程] TN249[电气工程—电工理论与新技术]