Impurities analysis of high-purity osmium target for M-cathode application  

作　　者：Jun-Da Ma Yang Xia Yuan-Feng Xie Chao Zhang 

机构地区：[1]GRIMAT Engineering Institute Co.,Ltd,Beijing,101407,China [2]State Key Laboratory of Advanced Materials for Smart Sensing,GRINM Group Co.,Ltd,Beijing,101407,China [3]General Research Institute for Nonferrous Metals,Beijing,100088,China

出　　处：《Rare Metals》2023年第4期1154-1159,共6页稀有金属（英文版）

基　　金：financially supported by the Key R&D Program of Ministry of Science and Technology(No.2017YFB0305400)。

摘　　要：Impurities and their distributions in osmium targets for M-type cathodes affect the coating quality on porous tungsten and cathode emission performance.Glow discharge mass spectrometry(GDMS)and X-ray photoelectron spectroscopy(XPS)were used to analyze the impurity contents and distributions in the osmium target.The chemical states of impurity elements were analyzed and characterized.The total amount of metallic impurity in the target was lower than 0.01 wt%.

关 键 词：OSMIUM IMPURITIES PURITY 

分 类 号：TG146.35[一般工业技术—材料科学与工程]