超构器件的设计、制造与成像应用  

Design,Fabrication,and Imaging of Meta-Devices

作　　者：冷柏锐 陈沐谷 蔡定平 Leng Borui;Chen Muku;Tsai Dinping(Department of Electrical Engineering,City University of Hong Kong,Hong Kong 999077,China;Centre for Biosystems,Neuroscience,and Nanotechnology,City University of Hong Kong,Hong Kong 999077,China;State Key Laboratory of Terahertz and Millimeter Waves,City University of Hong Kong,Hong Kong 999077,China)

机构地区：[1]香港城市大学电机工程系,中国香港999077 [2]香港城市大学生物系统、神经科学和纳米技术中心,中国香港999077 [3]香港城市大学太赫兹及毫米波国家重点实验室,中国香港999077

出　　处：《光学学报》2023年第8期3-21,共19页Acta Optica Sinica

基　　金：中国香港特别行政区大学教育资助委员会/研资局卓越学科领域计划项目与优配研究基金(AoE/P-502/20,15303521,11310522);广东省科学技术厅区域联合基金(重点项目)(2020B1515120073);深港创新圈计划D类项目(SGDX2019081623281169);香港城市大学研究基金(9380131)。

摘　　要：超构光学为平面光学器件的发展提供了新的思路与方向。超构器件由亚波长人工纳米结构组成,能在二维平面上实现对入射光的振幅、相位和偏振的操纵。研究人员已经发展了多种超构表面技术,将其用于满足各式各样的光学需求。本文首先回顾了超构器件的前沿研究与技术发展现状,介绍了超构器件的广义设计流程,并以连续宽带消色差超构透镜为例进行逐步说明,帮助读者理解;然后,展示了多种超构器件加工方法,包括直写刻蚀、图案转移刻蚀和混合图案刻蚀等,进一步讨论了超构器件在成像应用中的发展,包括偏振成像、光场成像、光学感测以及生物成像等;最后,进行了总结,并对超构器件未来的发展提出了见解与展望。Significance Meta-devices,the conceptual expansion of metasurfaces composed of sub-wavelength artificial nanostructures,are the advanced optical devices that have drawn much attention in recent years.Compared with traditional bulky optical components,which can shape the electromagnetic fields via gradual phase accumulation through propagation inside the medium,meta-devices provide new degrees of freedom for manipulating the amplitude,phase,and polarization of the incident light at a two-dimensional flat interface.The light-matter interaction in the metasurfaces is achieved in sub-wavelength nanostructures,which endow the metasurfaces with inherent features of compact size.Besides their flat and compact dimension,the main distinctions between metasurfaces and their conventional counterparts are their multifunctionality,tenability,and easy-to-integration.The above unprecedented characteristics give the metasurfaces great potential.Versatile metasurface technologies have been proposed to fulfill the demands for various optical applications.Meta-optics opens a new era of flat optical components.The design procedures or design flow for meta-devices are of importance to researchers in the field of flat optics.A general design flow facilitates the design,fabrication,and characterization of metasurfaces.By using commercial software to calculate the fundamental parameters for nanostructures with different dimensions and configurations,e.g.,dispersion functions,phase,and efficiency,a data library for all the structure designs can be created.Metasurfaces with specified requirements can be built efficiently based on the data library,which thus significantly reduces the design load.Following the fabrication and characterization procedures indicated in the general design flow,one can achieve versatile designs for metasurfaces.One great advantage of metasurfaces is their compatibility with the semiconductor microelectronics fabrication industry.Lithography,one of the most common nanofabrication technologies in the semiconductor

关 键 词：光学设计 超构器件 超构表面 纳米加工 光学成像 

分 类 号：O436[机械工程—光学工程]