介质超构表面的CMOS兼容制备工艺的进展  

Progress in CMOS-Compatible Fabrication Process of Dielectric Metasurfaces

作　　者：张弛 肖淑敏 Zhang Chi;Xiao Shumin(School of Materials Science and Engineering,Harbin Institute of Technology(Shenzhen),Shenzhen 518055,Guangdong,China)

机构地区：[1]哈尔滨工业大学(深圳)材料科学与工程学院,广东深圳518055

出　　处：《光学学报》2023年第8期35-46,共12页Acta Optica Sinica

摘　　要：超构表面为纳米光子器件赋予了更高的自由度与灵活度,使实用的微纳米光子器件的实现成为可能。基于高折射率半导体材料的介质超构表面制备技术可以和半导体集成电路的制作工艺结合,有希望在攻克超构表面大面积和高通量制备技术难题上发挥重要的作用,因此对其光场调控性能和制备工艺的研究是该领域近年来的重要发展方向。本文从硅、氮化硅和二氧化钛等介质超构表面出发,介绍了超构表面高通量制造技术的发展。此外,介绍了基于大面积制造技术实现实际应用的基于纳米光子器件的光学器件,如显示、成像、光调控器件。Significance Metasurfaces are composed of sub-wavelength electromagnetic resonator arrays,and they have attracted great attention because of their flexibly controlled polarization,amplitude,and electromagnetic phase of light waves at the sub-wavelength scale.At present,metasurfaces have experienced a fast-evolving development.Compared with traditional optical components,metasurfaces have obvious advantages and may become the most critical optical components to form a new generation of micro-optical systems,so as to provide a feasible way for miniaturizing and integrating optical systems.Unlike traditional refractive and diffractive optical components,metasurfaces have only a sub-wavelength thickness,which is thinner and can meet the increasing needs of miniaturized optical systems.Although the performance of metasurfaces has been highly extended by using various advanced design and fabrication methods,the practical application of metasurfaces is still limited by challenging large-area and high-throughput fabrication of sub-wavelength structures.All-dielectric metasurfaces based on semiconductor materials with a high refractive index have attracted more and more attention since they can be fabricated by using commercial complementary metal-oxide-semiconductor(CMOS)-compatible mass manufacturing technologies.Currently,nanoimprint lithography and deep ultraviolet lithography are widely used in CMOS-compatible mass manufacturing technologies,and researchers attempt to use them to realize the patterned growth of nanomaterials.However,due to the difference between materials,researchers need to develop new processes for each material.This paper mainly introduces the fabrication process and metasurface devices of each material,so as to help researchers choose convenient methods to fabricate metasurfaces.Progress In this paper,the background of high-throughput and large-area metasurface fabrication is introduced at first.In addition,compared with metal metasurfaces,all-dielectric metasurfaces have less energy loss and can

关 键 词：光学设计 超构表面 微纳制造 高通量制造 CMOS兼容制造工艺 

分 类 号：O436[机械工程—光学工程]