虹吸位置对底板安装型平衡式减压阀压力曲线的影响  

Influence of Siphon Position on the Pressure Curve of Baseplate Mounted Balanced Pressure Reducing Valve

作　　者：王建华 WANG Jianhua

机构地区：[1]埃迈诺冠气动器材(上海)有限公司,上海201108

出　　处：《今日自动化》2023年第3期71-74,共4页Automation Today

摘　　要：对一种新设计的底板安装型平衡式减压阀虹吸位置进行分析,重点从改变主阀口上面虹吸孔位置进行设计,并分析不同情况下输出流量的压力曲线,最终确定合理的虹吸位置。通过设计不同的虹吸位置,利用计算流体力学软件CFD,分析在不同位置下气体的流场分布曲线,确定合理的设计,并通过实际测试得出压力曲线的过程。The siphon position of a newly designed baseplate mounted balanced pressure reducing valve is analyzed,focusing on changing the position of the siphon hole above the main valve port,analyzing the pressure curve of the output flow under different conditions,and finally determining the reasonable siphon position.By designing different siphon positions and using computational fluid dynamics software CFD,the flow field distribution curve of the gas at different positions is analyzed,and the reasonable design is determined,and finally the pressure curve is obtained through actual test.

关 键 词：底板安装式 平衡式减压阀 虹吸位置 

分 类 号：TB535[理学—物理]