二维高通量光学显微成像技术研究进展  

Overview of two-dimensional high-throughput optical microscopy

作　　者：高宇婷 潘安[1,2] 姚保利 马彩文[1,2,3] GAO Yu-ting;PAN An;YAO Bao-li;MA Cai-wen(Xi'an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences,Xi'an 710119,China;University of Chinese Academy of Sciences,Beijing 100049,China;CAS Key Laboratory of Space Precision Measurement Technology,Xi'an 710119,China)

机构地区：[1]中国科学院西安光学精密机械研究所,陕西西安710119 [2]中国科学院大学,北京100049 [3]中国科学院空间精密测量技术重点实验室,陕西西安710119

出　　处：《液晶与显示》2023年第6期691-711,共21页Chinese Journal of Liquid Crystals and Displays

基　　金：国家自然科学基金(No.12104500)。

摘　　要：传统光学显微镜的视场与空间分辨率是相互制约的,如何突破这一限制,同时能兼得高分辨率和大视场的高通量成像,成为当前显微成像技术领域的主要研究方向之一。该科学问题的突破将有助于加速科学研究、提高生产制造能力、为医疗辅助诊断提供新工具。本文介绍比较了大孔径物镜制造与曲面探测技术、扫描拼接技术、傅里叶叠层显微成像技术、宽场结构光照明技术和无透镜片上显微成像技术在内的5种高通量显微成像技术。分析了高通量显微成像技术研究的当前现状、所面临的问题以及未来的发展趋势。分析指出,计算光学成像技术正逐渐成为目前高通量显微技术的主要手段,通过计算绕过或者突破光学系统的物理限制将开辟高通量显微成像新时代。The field of view(FOV)and spatial resolution of conventional optical microscopes are mutually constrained,how to break through this limit,and how to simultaneously obtain high resolution and large FOV for high throughput imaging is one of the main research directions in the field of microscopy.Solving this scientific problem will help to accelerate scientific research,improve manufacturing capabilities,and provide new tools for medically assisted diagnosis.This paper introduces and compares five cutting-edge high-throughput microscopy techniques,including large-aperture objective fabrication and curved detectors,scanning stitching method,Fourier ptychographic microscopy(FPM),wide-field structured light illumination microscopy(SIM)and lens-free on-chip microscopy.The current status,challenge and future trends of high-throughput microscopy techniques are also analyzed and reported.The analysis points out that computational imaging is gradually becoming the main means of high-throughput microscopy,which breaks or bypasses the physical limit of optical microscopy and will open up a new era of high-throughput microscopy imaging.

关 键 词：显微成像 高通量 计算成像 

分 类 号：O436.1[机械工程—光学工程]