TC4钛合金电解质等离子抛光工艺研究  

Study on electrolyte plasma polishing process of TC4 titanium alloy

作　　者：宰建轩 李辉[1] 袁益民 葛晓宏[1] ZAI Jianxuan;LI Hui;YUAN Yimin;GE Xiaohong(Fujian Key Laboratory of Functional Materials and Applications,Xiamen University of Technology,Xiamen 361024,China)

机构地区：[1]厦门理工学院福建省功能材料及应用重点实验室,福建厦门361024

出　　处：《电镀与涂饰》2023年第10期35-41,共7页Electroplating & Finishing

基　　金：福建省科技计划项目-对外合作项目(2020I0027);福建省自然科学基金面上项目(2021J011212)。

摘　　要：为确认电解质等离子抛光的加工时间、加工温度、加工电压、抛光液(2.25%NH4Cl+2%NH4F)质量分数等因素对TC4钛合金抛光效果的影响,对TC4钛合金抛光前后表面粗糙度、微观形貌、表层元素含量、显微硬度等进行检测。结果表明,加工时间和加工温度对TC4钛合金抛光效果的影响最大。抛光工艺参数的正交试验优化结果为:加工时间400 s,温度90℃,电压300 V,抛光液质量分数2.04%。抛光后TC4钛合金的表面粗糙度可低至0.0244μm。The effects of processing time,temperature,voltage,and mass fraction of electrolyte comprising NH4Cl 2.25%and NH4F 2%on the electrolyte plasma polishing effectiveness of TC4 titanium alloy were studied.The surface roughness,microstructure,microhardness,surficial element composition,and phase constitution of TC4 titanium alloy before and after being polished were examined.The results showed that the processing time and temperature have the greatest influence on the polishing effectiveness of TC4 titanium alloy.The polishing process parameters were optimized by orthogonal test as follows:processing time 400 s,temperature 90°C,voltage 300 V,and mass fraction of electrolyte 2.04%.The surface roughness of the polished TC4 titanium alloy reached as low as 0.0244μm.

关 键 词：钛合金 电解质等离子抛光 光亮度 表面粗糙度 微观形貌 

分 类 号：TG146[一般工业技术—材料科学与工程] TG178[金属学及工艺—金属材料]