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作 者:白静 邴单 李延标 白忠 奉勇辉 周璇 BAI Jing;BING Dan;LI Yanbiao;BAI Zhong;FENG Yonghui;ZHOU Xuan(Army Engineering University of PLA,Nanjing 210007,China;Pujiang Institute,Nanjing Tech University,Nanjing 211134,China)
机构地区:[1]陆军工程大学,江苏南京210007 [2]南京工业大学浦江学院,江苏南京211134
出 处:《陆军工程大学学报》2023年第3期87-92,共6页Journal of Army Engineering University of PLA
基 金:江苏省高等学校基础科学(自然科学)研究(21KJD510004)。
摘 要:通过构筑石墨烯/二硫化铼(ReS2)异质结实现了5层ReS2样品在空气中稳定性的提升。其中石墨烯是通过化学气相沉积法(CVD)制备,ReS2的热稳定性通过荧光强度进行表征。实验发现:对于原始的ReS2薄膜,当温度升高到500℃时,荧光峰严重展宽且荧光强度几乎消失,而石墨烯封装的ReS2样品,采用同样升温方式时,荧光峰依然很对称且荧光强度很高。通过进一步拟合其变化率发现,本征样品的荧光强度随温度的变化率为-224,而石墨烯封装的ReS2薄膜样品的荧光强度随温度的变化率为-173,说明通过石墨烯的保护,极大地提高了ReS2在空气中的热稳定性。这主要是因为石墨烯有效地隔绝了空气中的水、氧气等分子,钝化了ReS2表面的反应活性,从而提高了其化学稳定性。同时测试对比了石墨烯覆盖前后ReS2的光电性能,发现石墨烯的覆盖大大加快了ReS2的光电响应速度。该研究丰富了ReS2在半导体器件方面的应用。In order to apply Rhenium disulfide(ReS2)to semiconductor devices,the thermal stability of few-layer(five-layer)ReS2 in air should be investigated.In this paper,the van der Waals heterostructures of graphene and ReS2 by encapsulating ReS2 film with graphene were constructed,and the thermal stability of encapsulated ReS2 in air was characterized.The results show that the photoluminescence(PL)peak of ReS2 encapsulated by graphene keeps symmetrical and strong when the temperature increases to 500℃,while the PL peak of exposed ReS2 is decomposed almost completely at 500℃.By further fitting the change rate,it is found that the change rate of the pristine sample with temperature is-224,while that of the sample covered by graphene is-173,indicating that the thermal stability of ReS2 encapsulated by graphene can be improved significantly.The chemical stability of ReS2 covered by graphene is improved because it is separated from external water and oxygen molecules.In addition,it is found that the graphene coating also speeds up the photoelectric response of ReS2.The study has enriched the application of ReS_(2)samples in semiconductor devices.
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