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作 者:沙力撒 刘剑[1] SHA Lisa;LIU Jian(School of Mechanical Engineering,Sichuan University,Chengdu 610065)
出 处:《机械工程学报》2023年第7期176-185,共10页Journal of Mechanical Engineering
基 金:国家自然科学基金(51975390);四川大学-遂宁校地合作资助项目。
摘 要:为提高硬质合金钻针的钻削性能,利用脉冲磁场后处理技术,以0~2T的磁场强度对直径为0.5 mm的硬质合金钻针进行了后处理,对处理后的钻针在印刷电路板上进行了钻孔实验,并分别对钻针的磨损、钻孔质量、微观组织以及力学性能进行了表征。结果表明,在钻削4000和12000个孔后,经过处理后的钻针磨损均显著降低,其中当采用1T工艺时,钻针在钻削4 000个孔后,磨损面积减小了37.97%;而采用2T工艺时,钻针在钻削12 000个孔后,磨损面积减小了38%。经过处理后的钻针钻孔孔径较未处理的钻针波动范围减小,波动范围在0.47~0.5mm之间,而未处理钻针波动范围在0.44~0.49 mm之间,同时1.5T工艺可使孔壁粗糙度减小42%,有效提高孔壁光滑度。脉冲磁处理后钻针的纳米硬度和弹性模量分别提高了26%~116%和40%~312%,且硬度和弹性模量随着脉冲磁场强度的增大而增大。脉冲磁场诱导微观缺陷增殖是钻针钻削及力学性能的提升的主要原因。In order to improve the boring performance of the cemented carbide drill bit,pulsed magnetic field treatment was adopted to treat the drill bits with the diameter of 0.5 mm under the processing parameters of 0-2T.The drilling experiments were carried out on the printed circuit board,and the wear,drilling quality,microstructure and mechanical properties of the treated cemented carbide drill bits are characterized respectively.The results show that after drilling 4000 and 12000 bores,the wear area of the treated drill bit is significantly reduced.In particular,the wear area is reduced by 37.97%when 1 T parameter is used to drill 4000 bores while that is reduced by 38%when 2 T parameter is adopted to obtain 12000 bores.The diameter of the bores obtained by the pulsed magnetic field treated drill bit varies relatively small,with the diameter range of 0.47-0.5 mm,compared to that gained by the untreated drill bits,with the diameter range of 0.44-0.49 mm.When 1.5 T parameter is used,the roughness of the bore is reduced by 42%,which shows significantly improved surface quality of the wall of the bore.The hardness and the elastic modulus are enhanced by 26%-116%and 40%-312%respectively after the pulsed magnetic field treatment,and they exhibit an increasing tendency with the increasing strength of the field.The improved boring performance and the mechanical properties are attributed to the multiplication of the defects induced by the pulsed magnetic field.
分 类 号:TG156[金属学及工艺—热处理]
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