Plasma diagnosis of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition  

作　　者：王明磊 张林 陆文琪 林国强 Minglei WANG;Lin ZHANG;Wenqi LU;Guoqiang LIN(Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams of the Ministry of Education,Dalian University of Technology,Dalian 116024,People's Republic of China;Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials of the Ministry of Education,Anhui University of Technology,Maanshan 243002,People's Republic of China)

机构地区：[1]Key Laboratory of Materials Modification by Laser,Ion,and Electron Beams of the Ministry of Education,Dalian University of Technology,Dalian 116024,People's Republic of China [2]Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials of the Ministry of Education,Anhui University of Technology,Maanshan 243002,People's Republic of China

出　　处：《Plasma Science and Technology》2023年第6期88-94,共7页等离子体科学和技术（英文版）

基　　金：supported by the National Key Research and Development Program of China(No.2016YFB0101206);the Science and Technology Program of Wuhu(No.2021hg11);the Natural Science Foundation of the Anhui Higher Education in Institutions of China(No.2022AH050300)。

摘　　要：Filtered cathodic vacuum arc(FCVA)deposition is regarded as an important technique for the synthesis of tetrahedral amorphous carbon(ta-C)films due to its high ionization rate,high deposition rate and effective filtration of macroparticles.Probing the plasma characteristics of arc discharge contributes to understanding the deposition mechanism of ta-C films on a microscopic level.This work focuses on the plasma diagnosis of an FCVA discharge using a Langmuir dualprobe system with a discrete Fourier transform smoothing method.During the ta-C film deposition,the arc current of graphite cathodes and deposition pressure vary from 30 to 90 A and from 0.3 to 0.9 Pa,respectively.The plasma density increases with arc current but decreases with pressure.The carbon plasma density generated by the arc discharge is around the order of10^(10)cm^(-3).The electron temperature varies in the range of 2-3.5 eV.As the number of cathodic arc sources and the current of the focused magnetic coil increase,the plasma density increases.The ratio of the intensity of the D-Raman peak and G-Raman peak(I_(D)/I_(G))of the ta-C films increases with increasing plasma density,resulting in a decrease in film hardness.It is indicated that the mechanical properties of ta-C films depend not only on the ion energy but also on the carbon plasma density.

关 键 词：filtered cathodic vacuum arc Langmuir dual probe plasma density electron temperature 

分 类 号：O53[理学—等离子体物理]