磁控溅射技术制备氮化钛薄膜的研究进展  

Research Progress of TiN Films Prepared by Magnetron Sputtering Technology

作　　者：高正源[1] 杨栋 孙程锦 卢再亮 孙鹏飞 GAO Zhengyuan;YANG Dong;SUN Chengjin;LU Zailiang;SUN Pengfei(School ofMechatronics and Vehicle Engineering,Chongqing Jiaotong University,Chongqing 400074,China;Chongqing Management and Service Center of Solid Wastes,Chongqing 401121,China)

机构地区：[1]重庆交通大学机电与车辆工程学院,重庆400074 [2]重庆市固体废物管理服务中心有限公司,重庆401121

出　　处：《热加工工艺》2023年第8期6-11,共6页Hot Working Technology

基　　金：重庆市科技局项目(cstc2019jcyj-msxmX0761);重庆市教委科学技术研究项目(KJQN201800731)。

摘　　要：氮化钛薄膜具有出色的涂层性能,如高硬度、低电阻率和良好的耐蚀耐磨性等,在汽车、航空航天和生物医学中有着广泛的应用。磁控溅射技术因其成本低、沉积速率高以及绿色环保等优势,成为氮化钛薄膜制备的主要技术之一。综述了磁控溅射工艺参数对氮化钛薄膜择优取向、晶粒大小、膜层厚度、相组成和力学性能等的影响规律和作用机制。另外,还讨论了掺杂元素的种类、浓度和不同的退火温度对氮化钛薄膜组织结构与性能的影响。最后,提出了磁控溅射制备氮化钛薄膜的研究难点,并展望了未来磁控溅射技术制备氮化钛薄膜的发展方向。Titanium nitride thin films have excellent coating properties,such as high hardness,low resistivity and good corrosion resistance and wear resistance,which are widely used in automotive,aerospace and biomedical applications.Magnetron sputtering technology has become one of the main technologies for the preparation of titanium nitride films because of its low cost,high deposition rate and green environmental protection.The effects of magnetron sputtering process parameters on selective orientation,grain size,film thickness,phase composition and mechanical properties of titanium nitride films were reviewed.In addition,the influence of the type,concentration and different annealing temperature of doped elements on the microstructure and properties of titanium nitride films was also discussed.Finally,the research difficulties of preparing titanium nitride thin films by magnetron sputtering were put forward,and the development direction of preparing titanium nitride thin films by magnetron sputtering technology in the future was prospected.

关 键 词：磁控溅射 氮化钛薄膜 溅射参数 择优取向 力学性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理]