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作 者:方源 黄继杰 FANG Yuan;HUANG Jijie(School of Materials,Shenzhen Campus of Sun Yat-Sen University,Shenzhen 518107,China;Guangdong Provincial Key Laboratory of Magnetoelectric Physics and Devices,Sun Yat-Sen University,Guangzhou 510275,China;Centre for Physical Mechanics and Biophysics,School of Physics,Sun Yat-Sen University,Guangzhou 510275,China)
机构地区:[1]中山大学材料学院,广东深圳518107 [2]广东省磁电物性分析与器件重点实验室,广东广州510275 [3]中山大学物理力学与生物力学研究中心,广东广州510275
出 处:《材料研究与应用》2023年第3期394-411,I0002,共19页Materials Research and Application
摘 要:二氧化钒(VO_(2))是一种典型的二元过渡金属氧化物(TMO)和强关联材料,其具有金属-绝缘体相变特性(MIT),在约68℃时可实现单斜绝缘相和稳定金红石金属相的可逆转变,相变温度相对接近室温,因此有很好的应用前景,从而受到了非常广泛地关注。自Rudolf Peierls首次提出晶格畸变导致相变的假说和Mott预测电子间关联是导致相变发生的关键原因以来,VO_(2)的相变机理一直是极具挑战性和争议性的研讨问题,也是更好理解VO_(2)相变特性和优化其性能、拓展其应用的关键内容。总结了长期以来人们对VO_(2)相变机理的理解,归纳了为提高VO_(2)薄膜的性能做出的尝试,讨论了近年来相关行业的实践应用以及面临的问题和挑战,最后对VO_(2)薄膜的发展前景的进行了展望。VO_(2) is a typical binary transition metal oxide(TMO)and strongly correlated material with metal-insulator phase transition characteristics(MIT),which can realize the reversible transformation between monoclinic insulating phase and stable rutile metal phase at 68°C.As its phase transition temperature is relatively close to room temperature,it shows great potential in various applications and thus has attracted extensive attention.Since Rudolf Peierls first proposed the hypothesis that lattice distortion leads to the phase transition and Mott predicted that the correlation between electrons is the key causing phase transitions,the phase transition mechanism of VO_(2) has been a very challenging and controversial research topic,which is also the key to better understand the phase transition characteristics of VO_(2),optimize its performance,and expand its applications.This paper reviews the phase transition mechanisms of VO_(2) proposed by different researchers,summarizes the attempts made to improve the performance of VO_(2) films,discusses the practical applications of related industries in recent years,as well as the problems and challenges in the field,and finally summarizes the current status and presents the future prospectives in the field of VO_(2) films.
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