复配表面活性剂对氧化锌单晶衬底后清洗效果的影响  

Effect of Mixed Surfactants on Post Cleaning ZnO Single Crystal Substrates

作　　者：鲍冬赟 潘新花 王宁 黄靖云[1] 叶志镇[1] BAO Dongyun;PAN Xinhua;WANG Ning;HUANG Jingyun;YE Zhizhen(School of Materials Science and Engineering,Zhejiang University,Hangzhou 310027,China)

机构地区：[1]浙江大学材料科学与工程学院,浙江杭州310027

出　　处：《材料科学与工程学报》2023年第3期347-353,共7页Journal of Materials Science and Engineering

基　　金：浙江省重点研发计划资助项目(2021C01030)。

摘　　要：在ZnO单晶衬底的制造加工过程中,不可避免会引入二氧化硅磨料粒子、有机物等污染物,这会严重影响衬底上所生长薄膜的质量,从而影响半导体器件的性能和可靠性,因此后清洗工艺对外延薄膜的质量至关重要。本研究采用控制变量法研究了复配表面活性剂O-20和JFC的质量比及总质量对超声法后清洗效果的影响。研究发现,复配表面活性剂较单一表面活性剂对衬底表面污染的去除效果更好;不同质量比的复配表面活性剂的清洗效果不同,当O-20和JFC的质量比为2∶1时,对衬底表面污染的去除效果最好;当O-20和JFC的质量比固定为2∶1,增加复配表面活性剂的总质量,对衬底表面污染的去除效果更好;但当总质量增加到一定程度后,清洗效果不再提升,反而会增加表面活性剂的清除难度。In the manufacturing process of ZnO single crystal substrates,the contamination on the substrate is inevitable,including silica abrasive particles,organic matter and other pollutants,which will seriously affect the quality of the film growth on the substrate,thus affecting the performance and reliability of semiconductor devices.Therefore,the post-cleaning process is crucial to the quality of epitaxial films.In this work,we studied the influence of the mass ratio and total mass of mixed surfactants O-20 and JFC on the ultrasonic post cleaning process by the control variable method.It is found that the mixed surfactants show better performance in removing surface contamination than the single surfactant.The cleaning effect of mixed surfactants varies with different mass ratios.When the mass ratio of O-20 to JFC is 2∶1,the removal effect of surface pollutions is the best.When the mass ratio of O-20 to JFC is fixed at 2∶1,increasing the total mass of mixed surfactants will benefit the removal effect.However,when the total mass increases to a certain extent,further increasing it will not optimize the cleaning effect anymore,but will make it hard to remove surfactants.

关 键 词：复配表面活性剂 ZnO单晶衬底 后清洗 SIO2颗粒 

分 类 号：TB43[一般工业技术]