亚波长多功能微纳米结构制造及性能分析  

Fabrication and Performance Analysis of Subwavelength Multifunctional Micro-nanostructures

作　　者：王少强 陈智利[1] 毕倩 惠迎雪[1] 刘卫国[1] WANG Shaoqiang;CHEN Zhili;BI Qian;XI Yingxue;LIU Weiguo(School of Optoelectronic Engineering,Xi′an Technological University,Xi′an 710021,China)

机构地区：[1]西安工业大学光电工程学院,西安710021

出　　处：《光子学报》2023年第6期25-38,共14页Acta Photonica Sinica

基　　金：国家自然科学基金(No.62001364),陕西省教育厅重点科学研究计划(No.20JS059),陕西省科技厅(No.2023‒YBGY‒369)。

摘　　要：利用等效介质理论计算出区熔硅微纳米结构的几何尺寸,然后在有限元模拟的基础上建立了光学模型。研究了在长波红外(8~12μm)范围内的抗反射效果,并分别分析了表面形貌和结构特征尺寸对透射率的影响。通过自由基等离子源刻蚀技术和低能量离子束刻蚀技术联合制备的方式,在硅表面形成了具有抗反射自清洁功能的微纳米复合结构。测得其透射率为78%,静态接触角为125.77°,并对所得结构进一步分析,实验结果表明:在长波红外范围微纳米复合结构的抗反射性能优于仅存在单一微米结构时,且纳米级别的微结构对红外波段减反射作用并不明显,微米结构是提升硅材料表面长波红外范围透射率的主要因素;具有微纳复合结构的材料表面张力大于单一微/纳米结构,与理论模拟结果一致,表明微纳米结构的存在能够有效改善硅表面的疏水能力。Micro-nano structured functional surface is a hot topic in surface engineering research,and sub-wavelength structures have better anti-reflective properties.Geometric parameters of micro-nano structure on silicon surface are calculated by using equivalent medium theory.Then the above optical model structure is established based on finite element simulation and the optical properties are simulated using COMSOL Multiphysics commercial software to study the effect of reflection reduction in the long-wave infrared(8~12μm)range,and the effects of surface morphology and structural feature size on the transmittance are analyzed separately.According to the simulation results,it is concluded that the period of the micro-structure dominates its surface transmittance change.Under the condition that other structural parameters are consistent,changing the height can increase the transmittance in a small range.The transmittance of trapezoidal micron structure is higher than that of conical and square cylindrical;there is no obvious effect of reflection reduction of nanostructure in infrared band.The effects of period,microstructure height and duty cycle on the surface tension of zone-melted silicon are studied by analyzing the theoretical model of wettability,and it is found that the change trend of static contact angle of microstructure surface is positively correlated with height,and negatively correlated with cycle and duty cycle.The micron structures with a period of 6μm are formed by the Radical Plasma Source(RPS)etching technique at an etching gas flow rate of CF4∶O2∶Ar=400∶200∶20,a microwave power of 2000 W,an operating air pressure of 125 Pa,and an etching time of 150 s.On this basis,the dot,stripe and cone nanostructures are fabricated by low-energy ion beam etching(LE-IBE)with ion beam incidence angles of 60°,60°and 75°,incidence energies of 400 eV,600 eV and 400 eV,ion beam currents of 50 mA and etching times of 60 min,respectively;finally,the antireflective and self-cleaning nanocomposite structures ar

关 键 词：区熔硅 疏水性 微纳结构 亚波长 自由基等离子体源 低能离子束 

分 类 号：O484.1[理学—固体物理]