铬硼合金化镀膜材料制备工艺研究  

Research on the preparation process of chromium-boron alloy coating materials

作　　者：唐培新 吕周晋 车立达 吴战芳 刘桂荣 TANG Peixin;LYU Zhoujin;CHE Lida;WU Zhanfang;LIU Guirong(CISRI HIPEX Technology Co.,Ltd.,Beijing 100081,China)

机构地区：[1]钢研昊普科技有限公司,北京100081

出　　处：《江西冶金》2023年第3期218-223,共6页Jiangxi Metallurgy

摘　　要：以铬硼镀膜材料制备工艺为研究对象,分别采用真空热压烧结和热等静压两种方法制备铬硼合金。在相同烧结温度下,研究了不同压力施加方式对Cr-10%B合金试样的密度、显微组织及物相组成的影响。结果表明,当烧结温度为1300℃时,热等静压方法制备出致密度为6.96 g/cm^(3)、相对密度达100%、晶粒结合紧密、显微组织均匀、孔隙数量少、孔隙尺寸小的铬硼合金,在合金成分及烧结温度相同的条件下,两种工艺制备的铬硼合金物相一致,分别由Cr和Cr2B两种物相组成。In this paper,Cr-B alloy samples were prepared by vacuum hot pressing sintering and hot isostatic pressing,respectively.The effects of putting pressure in different ways at the same sintering temperature on the densities,microstructures and phase compositions of Cr-10%B alloy samples were explored.The findings of this study highlight that a sample with a density of 6.96 g/cm^(3)(100%relative density),tight grain bonding,uniform microstructure,fewer pores and smaller pore size was obtained by hot isostatic pressing when the sintering temperature is 1300℃.At the same sintering temperature and alloy composition,the samples of Cr-B alloy prepared in the two processes are consistent and consist of the Cr and Cr2B phases.

关 键 词：铬硼合金 真空热压烧结 热等静压 致密度 显微组织 

分 类 号：TG174.4[金属学及工艺—金属表面处理] TQ320.52[金属学及工艺—金属学]