Ti6Al4V表面增强CrN和TiN薄膜  

CrN and TiN Films Enhanced Surface Strength of Ti6Al4V Alloy

作　　者：司彪 时晓光 孙琳凡 杜峰 张开策 周艳文 SI Biao;SHI Xiao-guang;SUN Lin-fan;DU Feng;ZHANG Kai-ce;ZHOU Yan-wen(Research Institute of Surface Engineering,School of Materials and Metallurgy,University of Science and Technology Liaoning,Liaoning Anshan 114051,China;School of Chemical Engineering,University of Science and Technology Liaoning,Liaoning Anshan 114051,China;Automobile&Home Application Steel Institute,Iron&Steel Research Institution,Ansteel Group,Liaoning Anshan 114021,China)

机构地区：[1]辽宁科技大学材料与冶金学院表面工程研究所,辽宁鞍山114051 [2]辽宁科技大学化学工程学院,辽宁鞍山114051 [3]鞍钢集团钢铁研究院汽车与家电用钢研究所,辽宁鞍山114021

出　　处：《表面技术》2023年第7期444-454,共11页Surface Technology

基　　金：国家自然科学基金(51972155,52271056);辽宁省教育厅项目基金(LJKZ0278,LJKZ0306);海洋工程金属材料装备及应用国家重点实验室项目(HGSKL-UST LN(2020-05))。

摘　　要：目的研究表面增强氮化铬(CrN)和氮化钛(TiN)薄膜与Ti6Al4V(TC4)基体的适应性。方法采用热丝增强等离子体磁控溅射技术,通过改变热丝放电电流,在TC4合金表面制备CrN、TiN薄膜。采用扫描电子显微镜、X–射线衍射仪、纳米压痕仪、洛氏硬度计和摩擦磨损测试仪分别表征薄膜的组织形貌、成分、相结构、内应力、纳米硬度、弹性模量及耐磨性。结果随着热丝放电电流从0 A增加至32 A,等离子体密度增大,薄膜表面形貌由较疏松的四棱锥形转变成致密球形,截面柱状晶排列更加致密;薄膜择优取向从低应变能的(111)取向转变为低表面能的(200)取向;无热丝放电时TiN薄膜内应力高于CrN薄膜,随着热丝放电电流的增大,TiN薄膜内应力逐渐低于CrN薄膜;并且随着热丝放电电流的增大,薄膜的弹性模量与硬度均增大,但相同试验条件下CrN薄膜的弹性模量与硬度均低于TiN薄膜;压痕检测结果表明,薄膜与基体结合完好;低载荷摩擦磨损检测结果表明,硬度及弹性模量较高的TiN薄膜磨损量最低。结论在相同等离子体密度能量轰击下,硬度和弹性模量较高的TiN薄膜内应力增幅较小;低载荷磨损时,弹性模量及硬度较高、内应力较低的TiN薄膜更适用于Ti6Al4V基体的增强改性。Hot wire enhanced plasma magnetron sputtering technique(PEMS)is based on the traditional magnetron sputtering assisting by tungsten wires as an electron source to enhance greatly the plasma density.The growing film is going to be bombarded by high-density ions,which significantly improve the film's density and adhesion.Chromium nitride(CrN)and titanium nitride(TiN)films were prepared on the surface of Ti6Al4V(TC4)alloy by this PEMS.The adaptabilities of the CrN and TiN films to TC4 matrix were studied.The TC4 matrix with a thickness of 3 mm and a length and width of 15 mm was polished,alcohol cleaned and dried before set into the vacuum chamber for plasma bombarded to further inside cleaning.The CrN and TiN films were deposited on the TC4 matrix only by varying the hot wire discharge current from 0 A to 16 A and 32 A,respectively.The surface and cross-sectional morphology were observed by SIGMA HD field emission electron microscope,and the element content was measured.An X'pert Powder X-ray diffractometer was used for phase analysis,with a scanning range of 20°-100°,scanning time of 8 min,and 0.03(°)/step.The internal stress of the film was calculated by sin2ψmethod,whoseψdeviation was based on the Grazing Incidence X-Ray Diffraction(GIXRD)test.Each film's thickness was measured by an Alpha-step D-100 profilometer.A G200 nano indentation tester was used to measure the nano hardness and elastic modulus of the matrix and films.A Rockwell hardness tester with a load of 1470 N was used to test the adhesion by judging the failure edge of the indentation.The friction and wear properties of the films were evaluated by a MS-T3001 friction and wear tester.The results showed that the surface morphology of the films changed from loose pyramid to dense sphere and the columns got compact.The preferred orientations of the films changed from(111)with low strain energy to(200)with low surface energy,as the increase of hot wire discharge currents from 0 A to 32 A,i.e.,the increases of the plasma density.Without assisting of

关 键 词：TC4钛合金 等离子体增强磁控溅射 等离子体密度 氮化物薄膜 低载荷摩擦 

分 类 号：TG178[金属学及工艺—金属表面处理] TB79[金属学及工艺—金属学]