电感耦合等离子体原子发射光谱法测定盐酸中微量硅的含量  

Determination of Trace Silicon in Hydrochloric Acid by Inductively Coupled Plasma Atomic Emission Spectrometry

作　　者：施力玮 Shi Liwei(Shanghai Gerui Products Testing Company Limited,Shanghai 201210,China)

机构地区：[1]上海格瑞产品检测有限公司,上海201210

出　　处：《化学世界》2023年第4期211-214,共4页Chemical World

摘　　要：试样经稀释后,采用电感耦合等离子体原子发射光谱(ICP-AES)法直接测定盐酸中的硅含量,选择251.611 nm作为分析线。该方法在0.05~5.00 mg/L范围内线性关系良好,方法的检出限为0.01 mg/L,物质加标回收率为99.9%~103.3%,相对标准偏差为2.8%,该方法具有快速、准确、可靠的特点,适用于盐酸溶液中硅含量的测定。A method for the determination of trace silicon in hydrochloric acid by inductively coupled plasma atomic emission spectrometry(ICP-AES)was established while 251.611 nm was selected as the analytical line of silicon.This method has a good linear relationship at range of 0.05~5.00 mg/L,the detection limit is 0.01 mg/L,the recovery lies in 99.9%~103.3%and the relative standard deviation is 2.8%.This method is rapid,accurat and highly precise so that it can meet the requirements of determination of trace silicon in hydrochloric acid.

关 键 词：电感耦合等离子体原子发射光谱(ICP-AES) 盐酸 硅 

分 类 号：O657.31[理学—分析化学]