大塑性变形处理纳米尺度纯Ce及Ce-Ga合金的氧化行为及机理研究  

Oxidation Behavior and Mechanism of Dynamic Plastic Deformation Treated Nano-scale Pure Cerium and Ce-Ga Alloys

作　　者：赵朗朗 姜岳峰 赵东杨[2] 张勤 杨廷贵[1] Zhao Langlang;Jiang Yuefeng;Zhao Dongyang;Zhang Qin;Yang Tinggui(The 404 Company Limited,China National Nuclear Corporation,Scientific and Technical Research Institute;Institute of Metal Research,Chinese Academy of Sciences)

机构地区：[1]中核四〇四有限公司 [2]中国科学院金属研究所

出　　处：《特种铸造及有色合金》2023年第7期923-930,共8页Special Casting & Nonferrous Alloys

基　　金：中国核工业集团有限公司“青年英才”科研项目。

摘　　要：活性纯金属Ce室温氧化速率极高,提高其抗氧化性存在挑战。Ga的添加,一定程度上能降低其在空气中的氧化敏感性。利用纳米结构对形核的促进作用,通过动态塑性变形处理在纯Ce中引入位错胞亚结构,改善了氧化膜塑性,抑制了氧化膜内大尺寸微裂纹的形成,使纯Ce在潮湿空气下的氧化速率降低了50%。表面机械研磨处理使纯Ce表面形成大量微裂纹,加快了其氧化速率。纳米化处理可使Ce-Ga合金表层Ga元素分布更均匀,在表层更大范围内产生致密氧化膜,使Ce-Ga合金室温抗氧化性能进一步提升。The active pure cerium possesses an extremely high oxidation rate at room temperature,which becomes a challenge to improve oxidation resistance.The addition of gallium can reduce oxidation sensitivity to some extent.A dislocation cell substructure with an average size of 70 nm was introduced into the pure cerium by dynamic plastic deformation treatment by virtue of the promoting effect of nano-structure on nucleation,improving the plasticity of oxide film and inhibiting the formation of large-scale microcracks in the oxide film,where the oxidation rate of pure cerium in moist air is reduced by half.Large amounts of microcracks are generated on the surface of pure cerium due to surface mechanical grinding,which accelerates the oxidation rate.Gallium on the surface layer of Ce-Ga alloy is evenly distributed through nanocrystalline treatment,leading to a dense oxide film on the surface layer in a wider range,where the room temperature oxidation resistance of Ce-Ga alloy is further increased.

关 键 词：Ce-Ga合金 动态塑性变形 位错胞亚结构 氧化动力学 

分 类 号：TG139[一般工业技术—材料科学与工程]