用于双聚焦磁质谱仪的离子源电参数仿真研究  

Simulation of Voltage Parameters of the Ion Source for the Double Focusing Magnetic Mass Spectrometer

作　　者：刘畅[1] 肖梅[1] 张晓兵[1] LIU Chang;XIAO Mei;ZHANG Xiaobing(School of Electronic Science and Engineering,Southeast University,Nanjing Jiangsu 210096,China)

机构地区：[1]东南大学电子科学与工程学院,江苏南京210096

出　　处：《电子器件》2023年第3期657-662,共6页Chinese Journal of Electron Devices

摘　　要：离子源是双聚焦磁质谱仪的重要组成部分,离子源性能对质谱仪的分辨率、灵敏度有关键影响。通过COMSOL仿真,建立了用于双聚焦磁质谱仪的电子轰击型离子源的模型,并探究了离子源中电参数对性能的影响。仿真结果表明,在设计的离子源结构中,电离电压可在100 V~140 V之间找到一特定值,使电离几率最高,引出极电压和加速极电压均会影响离子的二次聚焦位置,从而影响引出离子束的束宽、角度分散、能量分散和引出率。仿真结果对离子源的实际电参数的设计有参考意义。As an important part of the double-focusing magnetic mass spectrometer, ion source has a critical influence on the resolution and sensitivity of the mass spectrometer. COMSOL is used to simulate the electron and the ion trajectory in the electron-impact ion source. The effects of the voltage parameters in the system on the performance of the ion source are also investigated by simulation. The simulation result shows that a best value between 100 V and 140 V can be found for the ionization voltage to realize the highest ionization rate. Simulation of the ion trajectory proves that voltage of the extraction plate and the acceleration plate can influence the second focusing location of the ion beam, which will influence the beam width, angular dispersion, energy dispersion and transmission efficiency of the ion beam correspondingly. The simulation results have reference significance for the parameter design of the ion source.

关 键 词：离子源 仿真 双聚焦磁质谱仪 聚焦性能 

分 类 号：TH843[机械工程—仪器科学与技术] TP391.9[机械工程—精密仪器及机械]