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作 者:Siyuan Zhang Jinlei Tao Rui Sun Shipeng Hu Jian Jiao
机构地区:[1]Northwestern Polytechnical University,Xi’an 710072,China
出 处:《Journal of Materials Science & Technology》2023年第13期81-92,共12页材料科学技术(英文版)
基 金:support from the Natural Science Basic Research Plan in Shaanxi Province of China (No.2020JM-087).
摘 要:Excellent impedance matching and high conduction loss are important factors for the preparation of high-performance electromagnetic wave(EMW)absorbing materials,but these two properties are of-ten contradictory.In this work,three absorbers with unique hollow structures,H-Ag/CuO@CuS,H-O-Ag/CuO@CuS,and H-P-Ag/CuO@CuS,are designed and synthesized by adopting hollow CuO@CuS with double shell as carrier and silver nitrate as the structural regulator.The more voids coming from hol-low structures,window-opened structures,and stacked pores improve the impedance matching of these absorbers,and the introduction of elemental Ag effectively regulates the conduction loss.Therefore,a balance between impedance matching and conduction loss is achieved to improve the reflection loss(RL)value and broadens the absorbing band of the absorbers.In comparison to H-Ag/CuO@CuS and H-O-Ag/CuO@CuS(hollow structure with open window)in which elemental Ag is uniformly dispersed in the CuO layer,H-P-Ag/CuO@CuS exhibits more excellent EMW absorption performance due to more voids and an optimized conductive network arising from Ag/CuO pieces distributed between the hol-low Ag/CuO@CuS particles and Ag distributed in the CuS layer.When the thickness is 2.3 mm,H-P-Ag/CuO@CuS provides an ultra-wide electromagnetic absorption band of 8.56 GHz(9.44-18 GHz),in which the RL<-10 dB and the minimum reflection loss of-41 dB.
关 键 词:Elemental sliver Impedance matching Conduction loss Electromagnetic wave absorption
分 类 号:TQ127.11[化学工程—无机化工] TB383.1[一般工业技术—材料科学与工程]
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