杂环类锌基光刻胶的制备及性能研究  

Preparation and Properties of Heterocyclic Zinc-based Photoresist

作　　者：吴蓉 赵炜珍 王公应 WU Rong;ZHAO Weizhen;WANG Gongying(Chengdu Institute of Organic Chemistry,Chinese Academy of Sciences,Chengdu 610041,China;University of Chinese Academy of Sciences,Beijing 100049,China;Institute of Process Engineering,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]中国科学院成都有机化学研究所,四川成都610041 [2]中国科学院大学,北京100049 [3]中国科学院过程工程研究所,北京100190

出　　处：《合成化学》2023年第8期610-616,共7页Chinese Journal of Synthetic Chemistry

摘　　要：随着微电子行业的高速发展,光刻胶在IC制造行业得到了越来越多的关注,金属氧簇光刻胶以高吸收性、尺寸小且易于调控的优势受到青睐。在常温下设计合成了以二水乙酸锌为金属源,2-巯基-1-甲基咪唑为配体的含杂环的锌氧团簇化合物Zn-2-MMI,其结构由X-射线单晶衍射和热重分析确证。结果表明:该材料尺度较小(1~2 nm),有助于得到高分辨图案;热稳定性能满足一般光刻的技术要求。通过高斯计算可知,最高占据分子轨道(HOMO)值较低(-6.64 eV),表明Zn-2-MMI具有一定的光化学反应潜力。在深紫外波长下进行曝光后,Zn-2-MMI光刻胶能在四甲基氢氧化铵水溶液和异丙醇中得到正负显影特征的图案;该光刻胶具有较高的灵敏度(45.5 mJ·cm^(-2)),表明了Zn-2-MMI具备作为新一代候选光刻材料的潜力。With the rapid development of the microelectronics industry,the photoresist has attracted more and more attention in IC manufacturing industry.Metal-oxygen cluster photoresist is favored for its advantages of high absorbability,small size and easy regulation.Zn-2-MMI,a heterocyclic Zn-oxygen cluster compound with zinc dihydrate as the metal source and 2-mercapto-1-methylimidazole as ligand,was designed and synthesized at room temperature.Its structure was confirmed by X-ray single-crystal diffraction and thermogravimetric analysis.The results show that the small scale of the material(1~2 nm)is conducive to obtaining high-resolution patterns.The thermal stability meets the technical requirements of general lithography.The HOMO(highest occupied molecular orbital)is low(-6.64 eV)by Gauss calculation,which indicates that Zn-2-MMI has certain photochemical reaction potential.After exposure at deep ultraviolet wavelength,Zn-2-MMI photoresist can obtain positive and negative development patterns in the aqueous solution of tetramethylammonium hydroxide and isopropyl alcohol.The high sensitivity of the photoresist(45.5 mJ·cm^(-2))indicates that Zn-2-MMI has the potential to be used as a new generation of photoliths.

关 键 词：锌基光刻胶 深紫外光刻 灵敏度 杂环 HOMO-LUMO带隙 正负显影特征 

分 类 号：O62[理学—有机化学]