高纯贵金属中杂质元素检测技术新进展  

New Progress in Detection Technology of Impurity Elements in High Purity Precious Metals

作　　者：王楠[1] 周宇 任士远 陈明丽[1] 刘西 WANG Nan;ZHOU Yu;REN Shiyuan;CHEN Mingli;LIU Xi(Analysis and Measurement Centre of Northeastern University,Shenyang,Liaoning 110819,China;Liaoning Institute for Food Control,Shenyang,Liaoning 110015,China)

机构地区：[1]东北大学分析测试中心,沈阳110819 [2]辽宁省食品检验检测院,沈阳110015

出　　处：《中国无机分析化学》2023年第9期959-966,共8页Chinese Journal of Inorganic Analytical Chemistry

基　　金：中央高校基本科研业务费资助项目(N2230003)。

摘　　要：高纯贵金属具有良好的抗腐蚀性、稳定的热电性、高温抗氧化性等优异的材料学特性,使得这一类材料在电子信息、生物医药、国防安全等领域有广泛的应用。高纯贵金属纯度是决定其性能和应用领域上限的重要指标,对贵金属生产工艺具有重要指导作用。综述近年来电感耦合等离子体发射光谱法、电感耦合等离子体质谱法、辉光放电质谱法等检测技术在高纯贵金属痕量杂质检测中的进展,对存在的问题进行了分析探讨,并对未来高纯贵金属中痕量杂质检测在评价体系和标准化方面的发展趋势进行了展望。High purity precious metals have excellent material properties such as good corrosion resistance,stable thermoelectric properties,and high-temperature oxidation resistance,making them widely used in fields such as electronic information,biomedicine,national defense and security.The purity of high-purity precious metals is an important indicator that determines their performance and upper limit of application fields,and plays an important guiding role in the production process of precious metals.The progress of detection technologies such as inductively coupled plasma atomic emission spectrometry,inductively coupled plasma mass spectrometry,and glow discharge mass spectrometry in the detection of trace impurities in high-purity precious metals in recent years was reviewed.The existing problems were analyzed and discussed,and the future development trend of trace impurity detection in high-purity precious metals in evaluation systems and standardization was prospected.

关 键 词：高纯贵金属 电感耦合等离子体发射光谱法 电感耦合等离子体质谱法 辉光放电质谱法 气体元素 

分 类 号：O657.31[理学—分析化学] O657.63[理学—化学]